Local Anesthetics

Abstract

The article contains sections titled: 1. Introduction 2. Benzoates 2.1. 4‐Aminobenzoates 2.2. Basic Benzoates and Aminobenzoates 2.2.1. Basic Benzoates 2.2.2. Basic Aminobenzoates 3. Carboxylic Acid Amides 3.1. Carboxylic Acid Anilides 3.2. Amides of Heterocyclic Carboxylic Acids 3.3. Amides of Aliphatic Carboxylic Acids 4. Basic Ketones and Ethers 4.1. Basic Ketones 4.2. Basic Ethers 5. Nitrogen‐Free Local Anesthetics

Defect-enabling zirconium-based metal–organic frameworks for energy and environmental remediation applications

“…177–180 Monoprotic acids are typically employed as modulators to generate defects during the cultivation of Zr-MOFs. Some frequently employed monoprotic acid modulators for synthesizing defective Zr-MOFs are hydrochloric acid (HCl, p K a = −7.00), 181,182 and monocarboxylic acids such as formic acid (HFo, p K a = 3.77), 183,184 acetic acid (HAc, p K a = 4.76), 43,183,184 benzoic acid (BA, p K a = 4.20), 184 trifluoroacetic acid (TFA, p K a = 0.23), 34,185–188 amino acids (AAs), 189 dichloroacetic acid (DCA, p K a = 1.30), 154 trichloroacetic acid (TCA, p K a = 0.66), 190,191 difluoroacetic acid (DIF, p K a = 1.24), 34,192 mercaptoacetic acid/thioglycolic acid (MA, p K a = 3.83), 193,194 dodecanoic acid (DDA, p K a = 5.3), 195 and 2-thiophenecarboxylic acids (p K a = 3.49). 196 Surfactants such as cetyltrimethylammonium bromide (CTAB) can also induce the defects in Zr-MOFs.…”