Lithography potentials of UV-nanoimprint

Thiol-yne Photo-curable Hybrid Resist: An Alternative for UV Nanoimprint Lithography (UV-NIL)

“…All of the resultant hybrid resists are a homogeneous, transparent and low viscosity system. The viscosities of these hybrid resists were controlled between 127 and 198 cP , which was appropriate in UV-NIL [36,37].…”

Nanoimprint Lithography

“…UV-NIL is one of the most important NIL technologies for structuring of large wafer areas up to 300 mm in diameter. The process offers several decisive technical advantages concerning overlay alignment accuracy, simultaneous imprinting of micro-and nanostructures and tool design due to the absence of high imprint pressures and thermal heating cycles (Fuchs et al, 2008, Bender et al, 2006. UV-NIL offers two approaches for patterning using either rigid quartz glass molds (Hard UV-NIL) or soft molds (Soft UV-NIL) for structuring of UV sensitive resists resulting in an etching mask for the substrate to be patterned (Glinsner et al, 2007.…”

“…Direct printing of functionalized resists finally will enter the extremely hot field of future device generations through a massive reduction of process steps in the fabrication sequence of complex systems. If the bridge between bottom up and top down is established the fabrication of highly dense complex structures with new functionalities will certainly dominate the future of UV-NIL (Fuchs et al, 2008). A crucial requirement for being able to further extend the success of the NIL technique is to improve resolution and throughput of conventional NIL schemes as well as to explore unconventional ways to utilize NIL processes for fabrication of novel nanodevices and nanomaterials.…”

Nanoimprint Lithography

“…In addition, NIL is able to achieve aspect ratios greater than 10. The progress made in the recent years enabled NIL not only a serious NGL candidate but also to a platform for one of the ten technologies in MIT Technology Review being evaluated to change the world (Fuchs et al, 2008). It has been added to the ITRS for the 32 and 22 nm nodes.…”