Semiconductor
nanowires are a class of materials that recently
have gained increasing interest in solar-cell applications and light-emitting
devices. Finding reproducible processing conditions is fundamental
for their future mass production. In this work, the stability of individual
epitaxial GaAs nanowires (NWs) under molecular beam epitaxy (MBE)
processing conditions is studied by means of a time-resolved in situ
micro X-ray diffraction (μXRD) method and scanning electron
microscopy. Our proposed μXRD method is a nondestructive characterization
technique where individual nanoobjects of different dimensions, crystal
orientations, and structures are detectable under MBE processing conditions.
NWs were grown by self-catalyzed MBE onto prepatterned Si(111) substrate.
When exposed to MBE processing conditions at 610 °C without supply
of a source material, or with only an arsenic (As) supply, we observe
evaporation from the facets with no indication of gallium (Ga) droplet
formation. Furthermore, the NWs, which are initially grown perpendicularly
to the substrate surface, become angularly unstable; i.e., the NWs
tilt and eventually lie down on the substrate surface. Before falling
down, our μXRD data evidenced vibration/bending of the NWs.
Interestingly, when exposed to the original growth conditions, which
include Ga and As supply, the vibrations/bendings are suppressed and
the tilting can be reversed. The findings in this paper can also provide
insights toward the engineering of self-catalyzed GaAs NW growth by
the removal of parasitic growth objects, which inevitably grow together
with NWs.