Lithographic properties of novel acetal-derivatized hydroxy styrene polymers

Abstract

Lithographic properties of a variety of acetal-derivatized hydroxy styrene based polymers are reported. The structural modifications in the polymers involve varying the size ofthe pendent acetal moiety. The lithographic performances of the resists containing structurally modified acetals were found to be superior to the conventional acetals. In the cases where the acidolysis products ofthe modified acetals are nonvolatile alcohols, the post-exposure volatilization, film shrinkage and plasma etch resistance were found to be significantly improved.