Lithographic Evaluation of Phenolic Resin—Dimethyl Siloxane Block Copolymers

Jurek, M. J.; Reichmanis, Elsa

doi:10.1021/bk-1989-0412.ch010

Cited by 6 publications

(1 citation statement)

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“…The arms are cross-linked to result in a network comb copolymer. Polymers with similar constitution have been synthesized previously by the hydrosilylation reaction. − However, the silylation reaction is adversely affected by moisture, and it is difficult to achieve 100% reaction in this chemistry. Rutnakornpituk et al attempted the curing reaction between novolac and a mixture of epoxy- and cyanide-functional PDMS and evaluated the influence of polarity of the modified siloxane on their microphase separation characteristics.…”

Section: Introductionmentioning

confidence: 99%

Comb Polymer Network of Polydimethylsiloxane with a Novolac Stem: Synthesis via Click Coupling and Surface Morphology Architecturing by Solvents

Sunitha¹,

Bhuvaneswari²,

Mathew³

et al. 2017

Macromolecules

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Cuprous iodide-catalyzed azide–alkyne cycloaddition (CuAAC) offered an easy route for the synthesis of organic–inorganic comb polymer networks with a short stem composed of novolac and arms made of lightly cross-linked polydimethylsiloxane (PDMS). This was achieved by the click reaction between novolac propargyl ether (NPE) and azide telehelic PDMS (PDMS-AZ) in a single step at near-ambient conditions. The precursors were absolutely characterized. The reaction, monitored by differential scanning calorimetry and rheometry, implied the cross-linking occurring at relatively low temperatures. The gelation occurred at a lower conversion than predicted by the Flory–Rehner equation. The reaction was facilitated by polar solvents. Dynamic mechanical analysis (DMA) implied biphasic behavior for the cross-linked polymer, the transitions of the soft and hard segments appearing at −110 and 26 °C, respectively. The calculated cross-link densities tallied well with the expected network structure. Solvents influenced the reorganization of the soft and hard segments as reflected in the water contact angle of these resins cast from different solvents. The morphological analyses by scanning electron microscopy and atomic force microscopy substantiated these findings.

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Section: Introductionmentioning

confidence: 99%

Comb Polymer Network of Polydimethylsiloxane with a Novolac Stem: Synthesis via Click Coupling and Surface Morphology Architecturing by Solvents

Sunitha¹,

Bhuvaneswari²,

Mathew³

et al. 2017

Macromolecules

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Phase‐Selective Chemistry in Block Copolymer Systems

Schwartz

Ober

2009

Advanced Nanomaterials

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Polymeric silicon‐containing resist materials

Miller

Wallraff

1994

Adv Material for Optics Elec

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Silicon-containing bilayer and trilayer photoresist technology is reviewed. Multilayer resist processes of this type rely on pattern generation in a thin imaging layer followed by pattern transfer to the thick planarising underlayer by oxygen reactive ion etching (RIE). The review concentrates on materials in which the silicon is an integral part of the polymer and does not specifically address photoresists where silicon is incorporated in a post-imaging process step (such as top-surface-imaging resists). The review is not exhaustive but emphasizes instead specific examples of representative resist chemistry.

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Lithographic Evaluation of Phenolic Resin—Dimethyl Siloxane Block Copolymers

Cited by 6 publications

References 0 publications

Comb Polymer Network of Polydimethylsiloxane with a Novolac Stem: Synthesis via Click Coupling and Surface Morphology Architecturing by Solvents

Comb Polymer Network of Polydimethylsiloxane with a Novolac Stem: Synthesis via Click Coupling and Surface Morphology Architecturing by Solvents

Phase‐Selective Chemistry in Block Copolymer Systems

Polymeric silicon‐containing resist materials

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