1997
DOI: 10.1295/polymj.29.387
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Lithographic Characterization of Poly(4-vinylphenyldimethylvinylsilane) Having Narrow Molecular Weight Distribution

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“…The polymers themselves form intermolecular cross-linkages, and thus can be used as negative working resists. Ensuing, lithographic evaluation was accomplished [79]. VS was used as the B monomer for preparing block-graft copolymers via a "grafting onto" process (a backbone coupling) [80].…”
Section: Poly[(4-vinylphenyl)dimethylvinylsilane] Pvsmentioning
confidence: 99%
“…The polymers themselves form intermolecular cross-linkages, and thus can be used as negative working resists. Ensuing, lithographic evaluation was accomplished [79]. VS was used as the B monomer for preparing block-graft copolymers via a "grafting onto" process (a backbone coupling) [80].…”
Section: Poly[(4-vinylphenyl)dimethylvinylsilane] Pvsmentioning
confidence: 99%