Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Chabala, J. M.; Abboud, Frank E.; Dean, Robert L.; Weaver, Suzanne; Cole, Damon M.; Sauer, Charles A.; Raymond, Frederick; Hofmann, Ulrich

doi:10.1117/12.351081

Search citation statements

Order By: Relevance

Paper Sections

Select...

Capabilities and Performance Results Of Pldc1

Data Reusability (Advantage) (Disadvantage)1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2000

2024

Publication Types

Select...

Other2

Article1

Relationship

Self Cite0

Independent3

Authors

Journals

Cited by 3 publications

(2 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The edge of the pattern is defined by exposure dose control of the edge pixel. This theory is generally called gray beam writing 6 . By giving precise dose to the edge pixel, the precise pattern edge is obtained.…”

Section: Capabilities and Performance Results Of Pldcmentioning

confidence: 99%

See 1 more Smart Citation

Curvilinear mask process correction embedded on multi-beam mask writer

Nakayamada,

Nomura,

Kato

et al. 2024

J. Micro/Nanopattern. Mats. Metro.

View full text Add to dashboard Cite

With the advent of inverse lithography technology, the landscape of electron beam lithography has undergone a paradigm shift, transitioning from a single variableshaped beam to a multi-beam writer. Conversely, in the realm of mask process correction (MPC), the majority of techniques continue to depend on the manipulation of figures and edges to adjust shape boundaries. We have developed a MPC system that is integrated within the multi-beam writer. This system leverages the rasterized pixel data for exposure, which is conventionally accessible within the writer itself. We describe how our inline MPC works in the pixel domain instead of geometry domain to improve pattern fidelity of curvilinear shapes without additional turnaround time.

show abstract

Section: Capabilities and Performance Results Of Pldcmentioning

confidence: 99%

“…This theory is generally called gray beam writing. 6 By giving precise dose to the edge pixel, the precise pattern edge is obtained. If the dose of edge pixel is increased, the pattern edge is shifted toward outside of the pattern.…”

Section: Data Reusability (Advantage) (Disadvantage)mentioning

confidence: 99%