Abstract:Cost and imaging are becoming big concerns in lithographic patterning of 32-nm half pitch and beyond, affecting the choice of lithographic patterning tools and the corresponding mask technology. In this paper, the cost and imaging aspects of ArF immersion double patterning, multiple e-beam maskless lithography, and extreme-uv lithography are discussed with proposals to make the cost acceptable. The impacts of these technologies to the masking industry are quite different. They are also given here. Some comment… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.