2020
DOI: 10.1016/j.apsusc.2019.144057
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Lithium storage kinetics of highly conductive F-doped SnO2 interfacial layer on lithium manganese oxide surface

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Cited by 21 publications
(16 citation statements)
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“…All FTO films fabricated by the HUSPD process showed characteristic diffraction peaks at 26.61°, 33.89°, 38.10°, and 51.78°, corresponding to the (110), (101), (200), and (211) planes of the SnO2 phase (JCPDS (Joint Committee on Powder Diffraction Standards) card No. #88-0287) [30]. In the bare FTO case, the lowest crystallinity was detected due to the low pyrolysis temperature of 350 °C and relatively short deposition time compared to the net-patterned FTO films [31].…”
Section: Structral and Chemical Propertiesmentioning
confidence: 95%
See 1 more Smart Citation
“…All FTO films fabricated by the HUSPD process showed characteristic diffraction peaks at 26.61°, 33.89°, 38.10°, and 51.78°, corresponding to the (110), (101), (200), and (211) planes of the SnO2 phase (JCPDS (Joint Committee on Powder Diffraction Standards) card No. #88-0287) [30]. In the bare FTO case, the lowest crystallinity was detected due to the low pyrolysis temperature of 350 °C and relatively short deposition time compared to the net-patterned FTO films [31].…”
Section: Structral and Chemical Propertiesmentioning
confidence: 95%
“…Due to the existence of stainless meshes and the difference of spacing sizes of them, the loading amount of sprayed precursor droplets onto the substrate was varied for each sample. Thus, for comparison, we adjusted the deposition time (15,35,30, and 25 min for the bare FTO, 60M-FTO, 40M-FTO, and 24M-FTO) to collect FTO samples with similar sheet resistance (~8 Ω/□).…”
Section: Methodsmentioning
confidence: 99%
“…The commonly employed methods to obtain FTO substrates involve chemical reactions on glass substrate, which can be heated and/or subjected to an additional thermal treatment step to produce fluorine‐doped tin oxide. Chemical precursors like SnCl 4 , SnCl 2 , C 4 H 9 SnC 13 and NH 4 F, CF 3 COOH have been used as tin and fluoride source in chemical spray pyrolysis, ultrasonic spray pyrolysis, atmosphere pressure chemical vapor deposition, electrochemical deposition at atmospheric pressure, not exclusively 44,46–49 . Considering that the precursors can be prepared in aqueous, acid, organic solutions and a mixture of them, hydrogen interaction is facilitated on the hydrophilic surface of silicate‐based glass substrates, on which O − ions, [glass](OH) − , acts as nucleation sites for heterogeneous surface reactions.…”
Section: Temperature Effects On Tco Substratementioning
confidence: 99%
“…In both processes, the dopant concentration and temperature have an important role on the FTO deposition rate. In general aspects and considering the usually employed chemicals, the global reaction for FTO deposition onto glass substrate submitted to a temperature able to promote thermal decomposition of byproducts can be expressed as: 47 SnCl4+4NH4F+2normalH2OF:SnO2+3HClfalse↑+NH4Clfalse↑+HFfalse(false↑false)…”
Section: Temperature Effects On Tco Substratementioning
confidence: 99%
“…These problems are related to the limited redox reaction rates of electrons and Li + ions, exfoliation of the electrode at the current collector by a volume dilatation, and dissolution of active materials, with corrosion of the current collector. 7,8 To overcome these problems, interfacial engineering is crucial strategy used to enhance the mechanical, electrochemical, and chemical stabilities of LIBs by designing a geometrical structure of interfaces. In terms of active materials, various studies have been conducted to prevent volume expansion, dissolution, and unstable surface reactions using the surface coating method (eg, LiAlO 2 coated LMO, 9 NB-doped TiO 2 coated LMO, 10 Li 2 CO 3 /LiNbO 3 coated NCM622, 11 and LiAlO 2 @Al 2 O 3 coated NCA 12 ).…”
Section: Introductionmentioning
confidence: 99%