Liquid metal alloy ion sources—An alternative for focussed ion beam technology

Bischoff, L.; Mazarov, Paul; Bruchhaus, L.; Giérak, J.

doi:10.1063/1.4947095

Cited by 64 publications

(46 citation statements)

References 219 publications

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“…Various other lithography modalities have been implemented in recent years to get around the diffraction limit or system cost, such as electron beam lithography (EBL), focused ion beam (FIB), nanoimprint lithography (NIL), and near‐field optical lithography. Most of these have been considered, but rejected, as candidates for the next‐generation lithography technique in the IC industry due to the preeminence of 193 nm immersion UVL and the forthcoming implementation of EUV lithography for the 7 and 5 nm technology nodes.…”

Section: Conventional Alternative Lithography Techniquesmentioning

confidence: 99%

Plasmonic Lithography: Recent Progress

Hong

Blaikie

2019

Advanced Optical Materials

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Plasmonic lithography has received extensive attention as both a potential candidate for next generation lithography and as an interesting testbed to test the fundamental resolution limits of optical imaging and patterning. Owing to the utilization of the otherwise lost evanescent near fields containing high frequency information, surface plasmon-based lithographic techniques can break the diffraction limit in conventional photolithography; resolution down to approximately 20 nm using visible light has been experimentally demonstrated, and theoretical studies have analyzed methods that have the potential for creating nanopatterns with sub-10 nm resolution. This paper reviews the research progress and various modalities of plasmonic lithography, addresses current obstacles and problems, and provides an outlook for practical application.

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Section: Conventional Alternative Lithography Techniquesmentioning

confidence: 99%

Plasmonic Lithography: Recent Progress

Hong

Blaikie

2019

Advanced Optical Materials

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“…Besides application to fundamental and applied studies of materials science problems the focus is on the development, applications and equipment that go beyond state-of-the-art Ga-FIB techniques. The in-house research is focused on the development of new analytical methods, instrumentation for in-situ experiments and the investigation of new ion sources (Bischo et al, 2016). Furthermore, these methods and procedures are used to investigate a wide range of ion material interactions in the fundamental as well as applied part of materials research (Hlawacek et al, 2014;Philipp & Bischo , 2012).…”

Section: Focused Ion Beam Techniquesmentioning

confidence: 99%

Ibc - Ion Beam Center

Borany

Facsko

Weissig

2017

JLSRF

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In the Ion Beam Center (IBC), various set-ups -electrostatic accelerators, ion implanters, plasma-based ion implantation equipment, low-energy ion tools, an ion microscope etc. -are combined into a unique facility for research and applications using ion beams. Almost all ions from stable chemical nuclides are available in the ion energy range from 10 eV to about 60 MeV. In addition to broad beams, also focused (down to 1 nm) and highly-charged (charge state up to 45 + ) ion beams, or ions extracted from a plasma can be provided. In total, the IBC operates more than 30 dedicated tools or beamline end-stations. The speci c expertise of IBC is the modi cation and analysis of solids by energetic ions aimed to develop novel materials for information technology, electronics or energy systems. In addition, ion beam analysis techniques became of increasing importance for interdisciplinary elds like geochemistry, climate or environmental research and resources technology. Special add-on services o ered ensure a successful realization of user experiments. Based on a long-term expertise, speci c equipment and common commercial procedures, the IBC is strongly active in the use of ion beam techniques for industrial applications aimed to initiate valuable product innovation.

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“…The extension to species other than Ga is an important one, as it opens possibilities for not only optimizing sputter yield and controlling contamination, but also for selective nanoscale implantation of specific species [ 14 ]. To this end, extension of the LMIS to alloys has recently seen development, expanding the possibility to as many as 46 different ionic species, with the incorporation of a mass filter in the source [ 15 ].…”

Section: Introductionmentioning

confidence: 99%

High-brightness Cs focused ion beam from a cold-atomic-beam ion source

et al. 2017

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We present measurements of focal spot size and brightness in a focused ion beam system utilizing a laser-cooled atomic beam source of Cs ions. Spot sizes as small as (2.1 ± 0.2) nm (one standard deviation) and reduced brightness values as high as (2.4 ± 0.1) × 107 A m−2 Sr−1 eV−1 are observed with a 10 keV beam. This measured brightness is over 24 times higher than the highest brightness observed in a Ga liquid metal ion source. The behavior of brightness as a function of beam current and the dependence of effective source temperature on ionization energy are examined. The performance is seen to be consistent with earlier predictions. Demonstration of this source with very high brightness, producing a heavy ionic species such as Cs+, promises to allow significant improvements in resolution and throughput for such applications as next-generation circuit edit and nanoscale secondary ion mass spectrometry.

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Liquid metal alloy ion sources—An alternative for focussed ion beam technology

Cited by 64 publications

References 219 publications

Plasmonic Lithography: Recent Progress

Plasmonic Lithography: Recent Progress

Ibc - Ion Beam Center

High-brightness Cs focused ion beam from a cold-atomic-beam ion source

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