2021
DOI: 10.1016/j.apsusc.2021.149501
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Liquid antimony pentachloride as oxidant for robust oxidative chemical vapor deposition of poly(3,4-ethylenedioxythiophene) films

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Cited by 12 publications
(15 citation statements)
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“…3 Thus, the oCVD reaction of DPP derivatives should allow to go far beyond the state-of-the-art of DPP-based materials by eliminating the restrictions dictated by solution-based approaches and allowing the synthesis, engineering and integration of DPP-based conjugated polymers for optoelectronic and catalytic applications. Further improvements may also involve the use of liquid oxidants, such as antimony pentachloride (SbCl 5 ) and vanadium oxytrichloride (VOCl 3 ), [76][77][78] in replacement of solid oxidants like FeCl 3 or CuCl 2 whose by-products remain in the oCVD coatings. 59 Moreover, the delivery rate of liquid oxidants can be more precisely regulated, resulting in better control of the oxidant to monomer ratio.…”
Section: Paper Materials Advancesmentioning
confidence: 99%
“…3 Thus, the oCVD reaction of DPP derivatives should allow to go far beyond the state-of-the-art of DPP-based materials by eliminating the restrictions dictated by solution-based approaches and allowing the synthesis, engineering and integration of DPP-based conjugated polymers for optoelectronic and catalytic applications. Further improvements may also involve the use of liquid oxidants, such as antimony pentachloride (SbCl 5 ) and vanadium oxytrichloride (VOCl 3 ), [76][77][78] in replacement of solid oxidants like FeCl 3 or CuCl 2 whose by-products remain in the oCVD coatings. 59 Moreover, the delivery rate of liquid oxidants can be more precisely regulated, resulting in better control of the oxidant to monomer ratio.…”
Section: Paper Materials Advancesmentioning
confidence: 99%
“…Within the chemical vapor deposition community, it is well known and documented that relative concentration of precursors, deposition temperature, and vacuum pressure could also be used to fine-tune film growth temperature. 279,280 Also, the fluid dynamics of the reaction environment which is associated with reactor size and configuration as well as flow channels all play a role. For industrial adaptation, it is crucial to record, quantify and model these aspects.…”
Section: Industrialization and Scale-upmentioning
confidence: 99%
“…With the SbCl 5 oxidant, uniform oCVD PEDOT was reported over 10-cm diameter silicon wafers. 6 In some cases, additional vapor-phase reactants, such as water or pyridine; or carrier gases, such as N 2 , are utilized along with the monomers and oxidants. Alternating periods of monomeronly and oxidant-only flow is termed oxidative molecular layer deposition (oMLD).…”
Section: Ocvd Chemistry and Processmentioning
confidence: 99%