2013
DOI: 10.1002/ejic.201201060
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Linear Heterometallic Co3Li2 and Co4Li2 Siloxides: Precursors for the Plasma Synthesis of Adsorbent Materials

Abstract: New linear heterometallic Co3Li2 and Co4Li2 arrays have been assembled with the use of disiloxanediolate and silsesquioxane ligands. Treatment of anhydrous CoCl2 with in situ‐prepared (Ph2SiOLi)2O afforded (thf)Co[Co{μ‐(Ph2SiO)2O}{(μ‐Cl)2Li(thf)2}]2 (5) as dark blue prisms in 73 % yield, while the analogous reaction of CoCl2 with in situ‐prepared Cy7Si7O9(OLi)3 (Cy = cyclohexyl) gave royal blue [Co2(μ‐Cy7Si7O12)(μ‐OSiMe3)(μ‐Cl){Li(thf)2}2]2 (6) in 68 % yield. Both of the new compounds have been structurally ch… Show more

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Cited by 11 publications
(1 citation statement)
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“…The chemistry of well-defined metal siloxides (metallasiloxanes) comprising the M–O–Si functionality continues to attract considerable interest due to the diverse potential applications of that functionality . Not only are metal siloxides excellent molecular models for silica-supported heterogeneous metal catalysts but they also serve as useful precursors for new materials, nanoparticles, well-defined surface species, and homogeneous catalysts . Moreover, it is well-established that siloxide ligands can support highly reactive metal complexes in low oxidation states (e.g., Co(I), Ti(III), Sm(II), U(III), etc.)…”
Section: Introductionmentioning
confidence: 99%
“…The chemistry of well-defined metal siloxides (metallasiloxanes) comprising the M–O–Si functionality continues to attract considerable interest due to the diverse potential applications of that functionality . Not only are metal siloxides excellent molecular models for silica-supported heterogeneous metal catalysts but they also serve as useful precursors for new materials, nanoparticles, well-defined surface species, and homogeneous catalysts . Moreover, it is well-established that siloxide ligands can support highly reactive metal complexes in low oxidation states (e.g., Co(I), Ti(III), Sm(II), U(III), etc.)…”
Section: Introductionmentioning
confidence: 99%