Light trapping in layer-transferred quasi-monocrystalline porous silicon solar cell

Combined Analytical and Phonon‐Tracking Approaches to Model Thermal Conductivity of Etched and Annealed Nanoporous Silicon

“…. [35] curve: Lognormal distribution with m ¼ 30 nm and s ¼ 0.57. considered different uniform pore size such as 30 [36] and 45 nm. [37] To assess the importance of choice of the average pore size, calculations considering a uniform pore size given by (i) the minimal pore size (10 nm), the median (30 nm), and the maximal pore size (100 nm) are also carried out.…”

Weighted estimates for tangential boundary behaviour

“…The enhanced optical absorption in thin silicon with nanovoids has already been reported experimentally [1][2][3][4] and also theoretically [1,5,6]. However, little work has been done on the electrical behaviour of thin silicon layers with nanovoids, though there has been reported work on computing the effective carrier density of other materials [7,8].…”

“…The double porous layer is finally annealed at high temperature from 900 to 1100 • C for times between 30 and 120 min in high vacuum [2,3] or hydrogen ambient [9][10][11]. The low porosity layer is then transformed into a monocrystalline layer termed QMS [2,3] or QMPS [5,6] that can itself act as a device layer or may be used as a seed layer for growing a silicon epitaxy layer over it. This layer contains nanovoids that have diameters of around 30 nm [11].…”

“…Although a quasimonocrystalline porous silicon (QMPS) layer [2][3][4][5] is taken here for a detailed case study, this methodology is suitable for any semiconductor film with a distribution of nanosized voids 3 Author to whom any correspondence should be addressed. in its bulk.…”

0.76% absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching

“…Wet texturing has been commonly used in the single crystal silicon (100) solar cell process by the acidic or alkaline solution [6][7][8]. The dry etching methods, such as mechanical diamond saw cutting [9], porous-Si etching [10], laserstructuring [11], photo-lithographically defined etching [12] and masked or maskless reactive ion etching (RIE) texturing, [13][14][15][16][17][18][19][20] etc. have recently been studied to help prepare the ideal surface textures.…”