2019
DOI: 10.1021/acsami.9b08268
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Light Trapping in Conformal Graphene/Silicon Nanoholes for High-Performance Photodetectors

Abstract: Hybrid graphene/silicon heterojunctions have been widely utilized in photodetectors because of their unique characteristics of high sensitivity, fast response, and CMOS compatibility. However, the photoresponse is restricted by the high reflectance of planar silicon (up to 50%). Herein, an improved graphene/Si detector with excellent light absorption performance is proposed and demonstrated by directly growing graphene on the surface of silicon nanoholes (SiNHs). It is shown that the combination of SiNHs with … Show more

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Cited by 29 publications
(30 citation statements)
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“…Therefore, a remarkable advancement in this area has also taken place recently. [ 43,69,70,72,74,75,83 ] The performance of PDs including graphene/Si Schottky junction‐based PDs are mainly evaluated by responsivity, specific detectivity, noise equivalent power (NEP), normalized photo‐to‐dark current ratio, etc. Responsivity ( R ) is given by the following relation: R=IphPinA where, I ph is the measured photo current, P in is the incident optical power density and A is the active area.…”
Section: Applications Of Cvd‐graphene/textured‐si Heterostructuresmentioning
confidence: 99%
See 1 more Smart Citation
“…Therefore, a remarkable advancement in this area has also taken place recently. [ 43,69,70,72,74,75,83 ] The performance of PDs including graphene/Si Schottky junction‐based PDs are mainly evaluated by responsivity, specific detectivity, noise equivalent power (NEP), normalized photo‐to‐dark current ratio, etc. Responsivity ( R ) is given by the following relation: R=IphPinA where, I ph is the measured photo current, P in is the incident optical power density and A is the active area.…”
Section: Applications Of Cvd‐graphene/textured‐si Heterostructuresmentioning
confidence: 99%
“…texturing of Si substrate to fabricate a high‐performance CVD‐graphene/Si based PD by Yang et al. [ 75 ] Direct growth of conformal graphene on SiNHs was achieved by using PECVD technique, and a conformal graphene/SiNHs heterojunction‐based photodetector was fabricated as shown in Figure 5. Figure a,b shows the schematic diagram and a SEM image of the fabricated conformal graphene/SiNHs PD, respectively, where PD was fabricated with the help of photolithography and lift‐off process.…”
Section: Applications Of Cvd‐graphene/textured‐si Heterostructuresmentioning
confidence: 99%
“…A recent report [108] describes the conformal growth of graphene on SiNH structure that worked as a photo-detecting device. In their process, silver-assisted etching method along with discretely distributed silver nanoparticles (AgNPs) was employed to form the SiNH structures as shown in Figure 5a.…”
Section: Conformal Graphene Growth On Silicon Nanostructuresmentioning
confidence: 99%
“…A technique of explicit growth of graphene coatings on the surface of silicon nanoholes (SiNHs) through plasma enhanced chemical vapor deposition (PECVD) was projected to accomplish transfer-free conformal graphene/SiNH photo detectors for the first time [108]. The conformal graphene/SiNH structures were found to have an exceptional light absorption pursuance with absorptions risen up to 90%, and also consist high power absorption densities, that results in more photo carrier procreations per unit volume in the SiNHs than planar silicon.…”
Section: Photodetectionmentioning
confidence: 99%
“…The utilization of conformal nanostructures formed on microarchitectures is of great significance for diverse applications, such as wetting tunability [ 1 , 2 ], flexible electronics [ 3 , 4 ], photodetectors [ 5 ], biomimetic photonics [ 6 ] and green energy [ 7 ]. Although micro/nanostructure fabrication via broad-range techniques of photolithography [ 8 ], laser etching [ 9 ], three-dimensional (3D) printing [ 10 ], thermal oxidation [ 11 ] and chemical deposition [ 12 ] has been highly developed, a method for validly constructing conformal nanostructures on complex microarchitectures remains elusive, especially for large-area fabrication of periodic nanostructures on convex and concave surfaces.…”
Section: Introductionmentioning
confidence: 99%