Light-induced self-written waveguide fabrication using 1550  nm laser light

Abstract

Light-induced self-written (LISW) optical waveguides were fabricated for the first time, to the best of our knowledge, using a photopolymerizable resin system formed by 1550 nm pulse laser light. A two-photon absorption (TPA) chromophore with a TPA cross section of several hundred Goeppert-Mayer (GM) at 1550 nm was used. Furthermore, the optical interconnection between a single-mode fiber and a fiber Bragg grating was demonstrated by the present technique, using one-way irradiation of 1550 nm laser light through the single-mode fiber. The LISW waveguide formation using 1550 nm laser light offers a new and promising alternative route for optical interconnection in silicon photonics technology.

Near-infrared dyes for two-photon absorption in the short-wavelength infrared: strategies towards optical power limiting

“…As an example, the design of luminescent molecular probes for deep imaging in the second transparency window (NIR-II region) for biphotonic microscopy imaging in the SWIR 244 is an emerging field of research that will require to optimize the two-photon brightness, which is the product of the two-photon cross-section in the SWIR by the emission quantum yield in the NIR. Another example concerns the development of 2PA-based photochemistry in this spectral range, as illustrated by recent photopolymerization at telecommunications wavelength, 359,360 but many other application can be envisaged. All these perspectives will encourage chemists to design new molecules combining 2PA in the SWIR with other properties (emission, ESA, electron transfer…) and further take into account all the constraints for the targeted application (solubility in biological medium or organic solvents, stability, functionalisation for bio-conjugation or grafting…).…”

Near-Infrared Self-Written Optical Waveguides for Fiber-to-Chip Self-Coupling

“…Herein, it is proposed that the light-induced self-written (LISW) waveguide technique has the potential to improve the alignment tolerance, insertion loss, and throughput. This technique can be used to fabricate a self-aligned polymer optical waveguide by simply applying the light emitted from optical components to the photopolymerizing resin [6][7][8][9][10][11][12][13][14][15][16][17]. For silicon photonics devices, inexpensive and efficient coupling can be realized by passive alignment with few microns accuracy, and subsequent LISW waveguide interconnection [7].…”

“…To connect silicon photonic devices on the basis of the LISW technique, it is necessary to fabricate an LISW waveguide at telecommunication wavelengths. In our previous work, LISW waveguides were fabricated from SMF at 1550 nm via twophoton polymerization using a pulse laser source [13,14] with a threshold power of about 7 W. We also previously fabricated a LISW waveguide from SMF at the wavelengths of 1070 nm and 1310 nm using a continuous wave (CW) laser [15,16]. The LISW waveguide fabrication threshold powers were 1 μW and 500 μW at the wavelengths of 1070 nm and 1310 nm, respectively.…”

Laser-written depressed-cladding waveguides deep inside bulk silicon

“…A particularly exciting application is fabricating waveguides as a basic element of the in-chip photonics toolbox with the potential to be used in optical interconnect or sensor applications, operating at near-infrared. Similar devices have been suggested as a promising solution to active alignment and coupling problems of Si-photonics with external optical components, for instance, interfacing with single-mode fibers [22]. In addition, they are highly desirable for integrating microfluidic technologies with photonic devices [8,13,23].…”