2019
DOI: 10.3390/electronics8060698
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Light Exposure Effects on the DC Kink of AlGaN/GaN HEMTs

Abstract: This paper presents the effects of optical radiation on the behavior of two scaled-gate aluminum gallium nitride/gallium nitride (AlGaN/GaN) high electron mobility transistors (HEMTs). The tested devices, having a gate width of 100 and 200 µm and a gate length of 0.25 µm, were exposed to a laser beam with a wavelength of 404 nm (blue-ray) in order to investigate the main optical effects on the DC characteristics. Owing to the threshold shift and the charge generation, a marked increase of the gate and drain cu… Show more

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Cited by 11 publications
(6 citation statements)
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“…An AlGaN back-barrier is commonly employed to block hot carriers from the channel into the buffer [20], but it also decrease 2DEG density because the back-barrier induces a sheet of negative charges at the GaN/AlGaN interface below the 2DEG channel. UV light was found to be able to suppress charge trapping in the buffer of GaN HMET [21], and changes in the trapping effect of devices exposed to UV light also influenced device output and noise characteristics [22][23][24]. Kang et al used a buffer layer consisting of multiple carbon-doped and undoped GaN layers to compensate the deep-acceptor states in the carbon-doped parts by electrons transferred from the undoped GaN regions [25,26], which helps to weaken buffer-induced CC under low drain voltage stress.…”
Section: Simulation Modelmentioning
confidence: 99%
“…An AlGaN back-barrier is commonly employed to block hot carriers from the channel into the buffer [20], but it also decrease 2DEG density because the back-barrier induces a sheet of negative charges at the GaN/AlGaN interface below the 2DEG channel. UV light was found to be able to suppress charge trapping in the buffer of GaN HMET [21], and changes in the trapping effect of devices exposed to UV light also influenced device output and noise characteristics [22][23][24]. Kang et al used a buffer layer consisting of multiple carbon-doped and undoped GaN layers to compensate the deep-acceptor states in the carbon-doped parts by electrons transferred from the undoped GaN regions [25,26], which helps to weaken buffer-induced CC under low drain voltage stress.…”
Section: Simulation Modelmentioning
confidence: 99%
“…The success of these technologies lies in the peculiar characteristics of the microwave circuits, mainly in terms of low cost, easy integration with traditional electronic systems and compact dimensions, i.e., the higher the frequency the smaller the size [ 3 , 4 , 5 , 6 , 7 ].…”
Section: Introductionmentioning
confidence: 99%
“…The progress of the power electronics industry has been contingent on the level of progress in the semiconductor power device industry, otherwise known as the power electronic device industry and this particularly on the advancements in power electronic switches [ 8 ]. The power electronic switch industry has grown and improved drastically over the years and is now in a transitional phase from the more common silicon semiconductor technologies to a totally new phase of wide band gap (WBG) technologies [ 9 , 10 , 11 , 12 , 13 , 14 , 15 , 16 ]. This new phase is characterized by an improvement in the various characteristics and manufacturing techniques already in place for power electronic switches [ 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 ].…”
Section: Introductionmentioning
confidence: 99%