2009
DOI: 10.1016/j.physe.2008.08.009
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Light emitting devices based on nanocrystalline-silicon multilayer structure

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Cited by 49 publications
(47 citation statements)
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“…In addition, under AC biasing some interesting features (Fig. 22b) appear that suggest that injection in ML samples is through direct tunneling, while in SL it is through FowlerNordheim tunneling [162]. ML samples show strong EL for low gate voltage and almost independent of it.…”
Section: Methodsmentioning
confidence: 97%
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“…In addition, under AC biasing some interesting features (Fig. 22b) appear that suggest that injection in ML samples is through direct tunneling, while in SL it is through FowlerNordheim tunneling [162]. ML samples show strong EL for low gate voltage and almost independent of it.…”
Section: Methodsmentioning
confidence: 97%
“…Fig. 21 show a typical Si-nc LED that we have studied to optimize bipolar injection [162,163]. It consists in a 20-30-nm thick oxide enriched by nano-Si, with two different structures: one has a single SRO composition; the others have a multilayer (ML) structure composed by alternating nm-thick SiO 2 and SRO layers.…”
Section: Methodsmentioning
confidence: 99%
“…Using multilayer structures in electroluminescence experiments has a relatively long history [122][123][124][125][126]. Nowadays, interest in multilayers has been revived [127][128][129], supported by several enhanced properties of the multilayer LED with respect to a single-layer nanocrystalline silicon LED: low turn-on voltages, low leakage currents, high nanocrystal density, and more uniform nanocrystal size. The main advantage of the multilayer structure is the possibility of exercising a better control over the nanocrystal formation through the confined silicon growth and, hence, the possibility of accurately designing the nanocrystalline silicon layer of the LED.…”
Section: Si-nc-based Ledmentioning
confidence: 99%
“…Multilayer devices show much higher current density in the low electric field region. The multilayer SRO 3 nm/SiO 2 2 nm has the same average silicon content as the single layer and lower silicon content than the SRO 4 nm/SiO 2 2 nm[127].…”
mentioning
confidence: 97%
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