2010
DOI: 10.1002/macp.201000474
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Light‐Directed Anisotropic Reorientation of Mesopatterns in Block Copolymer Monolayers

Abstract: Photoreorientation of a stripe pattern consisting of an MPS structure in a Langmuir‐Blodgett monolayer by irradiation with linearly polarized light is achieved for the first time using a PDMS/poly(methacrylate) diblock copolymer with a liquid crystalline azobenzene‐containing side chain. The stripe MPS pattern in the trans azobenzene state is diminished by photoisomerization to the cis form upon UV light irradiation. By the erasure of the MPS structure, the anisotropic photo‐oriented stripe pattern is generate… Show more

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Cited by 24 publications
(14 citation statements)
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References 46 publications
(12 reference statements)
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“…Based on the steep uprise in the π- A curve, the estimated molecular occupied area of the Az monomer unit was 0.3 nm 2 . This value agrees well with that previously reported for a similarly occupied area of mesogenic Az polymers 52 , 53 , suggesting that PAz forms a stable monolayer film on a water surface.
Figure 2 LS deposition of a PAz monolayer on a PCPBz film.
…”
Section: Resultssupporting
confidence: 92%
“…Based on the steep uprise in the π- A curve, the estimated molecular occupied area of the Az monomer unit was 0.3 nm 2 . This value agrees well with that previously reported for a similarly occupied area of mesogenic Az polymers 52 , 53 , suggesting that PAz forms a stable monolayer film on a water surface.
Figure 2 LS deposition of a PAz monolayer on a PCPBz film.
…”
Section: Resultssupporting
confidence: 92%
“…Copyright 2005, American Chemical Society). Photoalignment of 2D MPS pattern in a monolayer state using a poly(dimethylsiloxane) containing diblock copolymer (Table , 12 ) (Adapted with permission . Copyright 2010, John Wiley & Sons).…”
Section: Photocontrol and Alignment Of Microphase Separation In Blockmentioning
confidence: 99%
“…Alignment of MPS structure in the monolayer state is a highly challenging issue because the conformational freedom of the chains is highly restricted in the 2D state. Aoki et al unexpectedly came across an observation in which the MPS structure was diminished by UV irradiation in a block copolymer monolayer comprising an azobenzene polymer and poly(dimethyl siloxane) (PDMS) (Table , 12 ). In the initial trans ‐state of azobenzene, the monolayer exhibited a stipe morphology of Langmuir monolayer on the water surface.…”
Section: Photocontrol and Alignment Of Microphase Separation In Blockmentioning
confidence: 99%
“…Photochromic reactions have frequently been incorporated in LC media because of their repeatability for controlling material properties. This approach has provided various types of smart, light-responsive materials 1 exhibiting surface-mediated photoalignment of LC materials, [2][3][4][5][6] photoinduced phase transitions, [7][8][9][10][11][12] photoorientation/addressing of polymer thin films, [13][14][15][16][17][18] photoinduced mass migrations, [19][20][21][22][23][24][25][26][27][28] phototactic sliding motions, [29][30][31] photo-driven motions and morphology of monolayers, [32][33][34][35] and macroscopic photomechanical deformations. [36][37][38][39][40][41][42][43][44][45][46] Photoalignment research and technology started in 1988 with the discovery of the reversible alignment control of nematic LCs by the photoisomerization of azobenzene on a substra...…”
Section: Introductionmentioning
confidence: 99%