2015
DOI: 10.1109/ted.2015.2458339
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Leti-UTSOI2.1: A Compact Model for UTBB-FDSOI Technologies—Part I: Interface Potentials Analytical Model

Abstract: A detailed presentation of the latest version of the Leti-UTSOI compact model is provided. Leti-UTSOI2 is the first available model able to describe the behavior of low-doped ultrathin body and buried oxide fully depleted silicon-oninsulator transistors in all bias configurations, including strong forward back bias. In this part, a full analytical calculation of interface potentials, valid for all regimes of independent doublegate device operation, is detailed. This analytical computation, which is the heart o… Show more

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Cited by 44 publications
(18 citation statements)
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“…Given these facts, it is more objective to present the methodology for the design of a circuit with only model generated parasitic capacitance take into account and, perhaps, a representation of a few interconnect parasitic capacitances at critical nodes. For these reasons, the presented algorithms take into account only parasitic capacitances predicted by the CEA-Leti UTSOI2.1 transistor model [23], [24]. Regardless of the afore-mentioned reasons, there is a possi- for each passed TF do…”
Section: A Components Of the Proposed Design Methodologymentioning
confidence: 99%
“…Given these facts, it is more objective to present the methodology for the design of a circuit with only model generated parasitic capacitance take into account and, perhaps, a representation of a few interconnect parasitic capacitances at critical nodes. For these reasons, the presented algorithms take into account only parasitic capacitances predicted by the CEA-Leti UTSOI2.1 transistor model [23], [24]. Regardless of the afore-mentioned reasons, there is a possi- for each passed TF do…”
Section: A Components Of the Proposed Design Methodologymentioning
confidence: 99%
“…Accurate surface potentials for IDG MOSFET have been proposed in [14]- [17]. However, those methods are applicable to only free carriers or need iterative resolution of the Poisson equation.…”
Section: A Surface Potential Calculationmentioning
confidence: 99%
“…The ILD serves as the buried oxide (BOX) of the SOI devices. CEA-LETI's UTSOI2.1 model for ultra thin body SOIs is used for these devices, [9], [10]. The relatively thick (500 nm) ILD minimizes the coupling between the two tiers as this is described in [11].…”
Section: B Device Modelsmentioning
confidence: 99%