Less Energetic Routes for the Production of SiOx Films from Tris(dimethylamino)silane by Plasma Enhanced Atomic Layer Deposition
Danielle C. F. S. Spigarollo,
Tsegaye Gashaw Getnet,
Rita C. C. Rangel
et al.
Abstract:SiOx films, frequently derived from amino silane precursors, have found several applications with high added value. Although frequently used, the deposition of coatings from Tris(dimethyl amino) silane (TDMAS) has been reported to demand considerable amounts of energy, mainly due to the difficulty of oxidizing such compounds. As is well known, Plasma-enhanced atomic layer deposition (PEALD) is able to improve the oxidation efficiency, even under low processing temperatures. Owing to this, PEALD can be consider… Show more
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