LER detection using dark field spectroscopic reflectometry

Sidewall roughness in nanolithography: origins, metrology and device effects

“…Other approaches employ dark-fi eld scatterometry, ellipsometry, angular resolved scatterometry, etc. (Brill et al ., 2010;Foldyna et al ., 2011;Shyu et al ., 2007). Modeling studies have also been performed, testing new techniques in simulating the effects of LER on scattered light such as the fi eld-stitching method (Schuster et al ., 2009).…”