2020
DOI: 10.1016/j.nima.2020.164379
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Layout and performance of HPK prototype LGAD sensors for the High-Granularity Timing Detector

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Cited by 22 publications
(14 citation statements)
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“…Currently, a few research facilities around the world are involved in the development of LGADs, such as Brookhaven National Laboratory (BNL, Upton, NY, USA) [ 7 ], CNM, Fondazione Bruno Kessler (FBK, Trento, Italy) [ 8 ], Hamamatsu (Japan) [ 9 ], IHEP-NDL (Beijng, China) [ 10 ] and Micron (Lancing, UK) [ 11 ]. In addition, read-out electronics are actively being developed.…”
Section: Introductionmentioning
confidence: 99%
“…Currently, a few research facilities around the world are involved in the development of LGADs, such as Brookhaven National Laboratory (BNL, Upton, NY, USA) [ 7 ], CNM, Fondazione Bruno Kessler (FBK, Trento, Italy) [ 8 ], Hamamatsu (Japan) [ 9 ], IHEP-NDL (Beijng, China) [ 10 ] and Micron (Lancing, UK) [ 11 ]. In addition, read-out electronics are actively being developed.…”
Section: Introductionmentioning
confidence: 99%
“…Low Gain Avalanche Detectors (LGADs) have been widely studied during the last years by the high energy physics community [ 1 , 2 , 3 , 4 , 5 ]. Based on the Avalanche Photodiode (APD) concept, the LGAD exhibits an intrinsic multiplication in the linear region, providing a gain of 5–20.…”
Section: Introductionmentioning
confidence: 99%
“…They have been pioneered by the Centro Nacional de Microelectronica (CNM, Barcelona, Spain) [7] and developed during the past few years within the CERN-RD50 community. Currently, the sensor R&D is still very active and many research facilities around the world are involved such as: Brookhaven National Laboratory (BNL, Upton, United States) [8], CNM, Fondazione Bruno Kessler (FBK, Trento, Italy) [9], Hamamatsu (Japan) [10], IHEP-NDL (Beijng, China) [11], Micron (Lancing, United Kingdom) [12]. It is worth mentioning that there are families of LGADs which are fabricated on thick substrates: iLGADs [13] are double-sided LGADs (multiplication layer on one side and hole-collecting finepitch electrodes on the opposite side of the wafer) which are fabricated on thick high-resistivity silicon wafers.…”
Section: Introductionmentioning
confidence: 99%