2015
DOI: 10.1002/pssr.201409561
|View full text |Cite
|
Sign up to set email alerts
|

Layered MoS2 grown on c ‐sapphire by pulsed laser deposition

Abstract: Layered growth of molybdenum disulphide (MoS2) was successfully achieved by pulsed laser deposition (PLD) method on c ‐plane sapphire substrate. Growth of monolayer to a few monolayer MoS2, dependent on the pulsed number of excimer laser in PLD is demonstrated, indicating the promising controllability of layer growth. Among the samples with various pulse number deposition, the frequency difference (A1g–E12g) in Raman analysis of the 70 pulse sample is estimated as 20.11 cm–1, suggesting a monolayer MoS2 was ob… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

4
89
0

Year Published

2016
2016
2021
2021

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 138 publications
(93 citation statements)
references
References 26 publications
4
89
0
Order By: Relevance
“…Growth of large-area MoS2 has been demonstrated primarily using chemical vapor deposition (CVD) technique [18][19][20][21]. Vacuum-based methods such as pulsed laser deposition (PLD) [22][23][24], and magnetron sputtering [25] have also displayed promise. Also many applications necessitates that the TMDs be compatible with a wide variety of substrates, apart from large-area growth.…”
Section: Introductionmentioning
confidence: 99%
“…Growth of large-area MoS2 has been demonstrated primarily using chemical vapor deposition (CVD) technique [18][19][20][21]. Vacuum-based methods such as pulsed laser deposition (PLD) [22][23][24], and magnetron sputtering [25] have also displayed promise. Also many applications necessitates that the TMDs be compatible with a wide variety of substrates, apart from large-area growth.…”
Section: Introductionmentioning
confidence: 99%
“…The first step is the deposition of precursor material MoO 3 on the c ‐sapphire by E‐gun. Compared with the MoO 3 films prepared by other deposition methods, such as sputtering and pulsed laser deposition, the MoO 3 film deposited by E‐gun exhibits larger area, high uniformity, and adjustable thickness, which guarantees the synthesis of wafer‐scale and high‐quality MoS 2 films in the second step. The second step is the sulfurization process of MoO 3 by H 2 S and Ar gaseous mixture.…”
Section: Resultsmentioning
confidence: 99%
“…The first two peaks (228.3 and 231.9 eV) are attributed to the doublet Mo 3d 5/2 and Mo 3d 3/2 , respectively, correlating to Mo 4+ state in MoS 2 (typical of the Mo-S bond). The third peak of Mo 3d 5/2 at 235.1 eV is attributed to the Mo 6+ state of MoO 3 , typical of the Mo-O bond [50]- [52]. The formation of this kind of bond has been reported elsewhere [18], [51], [53], [54], and suggests strong chemical and electronic coupling between the MoS 2 and rGO NSs in the synthesized samples.…”
Section: Resultsmentioning
confidence: 54%