Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography
Sihyun Woo,
Ji Hye Baek,
Chawon Koh
et al.
Abstract:Extreme-ultraviolet (EUV) photolithography, which enables the highthroughput production of well-defined patterns with critical dimensions on the scale of several nanometers, is essential for the fabrication of a highly integrated semiconductor. The full exploitation of EUV lithographic techniques necessitates the development of photoresist (PR) materials with both high EUV sensitivity and a long shelf-life. However, despite notable advances, the available library of EUV PR materials remains limited. Here we re… Show more
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