Layer-by-layer thinning of two-dimensional materials

Abstract

Etching technology – one of the representative modern semiconductor device makers – serves as a broad descriptor for the process of removing material from the surfaces of various materials, whether partially or entirely.

Art etching of graphene

“…74 This method is a gentle and controlled process and can minimize damage, preserving the intrinsic properties of graphene. 75 ALD can potentially create high aspect ratio nanopores with smooth sidewalls, which is advantageous for applications like filtration and sensing where a precise pore geometry is essential. Therefore, ALD-produced art etched graphene is necessary for the creation of nanoscale electronics.…”