Single crystal (100) wafers of n-InSb were implanted with 50 MeV Li3+ ions at various fluences ranging from 1010 to 1014 ions/cm2 at room temperature. Investigations of the optical, electrical, and structural properties of the as-grown, irradiated, annealed wafers were carried out by infrared and Raman spectroscopies, Hall measurements, and high resolution x-ray diffraction (HRXRD). In the case of samples irradiated with an ion fluence of 1.6×1014 ions/cm2, electrical measurements at 80 K reveal that there is a decrease in carrier concentration from 8.5×1015 (for unirradiated) to 1.1×1015/cm3 and an increase in mobility from 5.4×104 to 1.67×105 cm2/V s. The change in carrier concentration is attributed to the creation of electron trap centers induced by ion beam irradiation and the increase in mobility to the formation of electrical inactive complexes. Nevertheless, even with the irradiation at 1.6×1014 ions/cm2 fluence the crystalline quality remains largely unaffected, as is seen from HRXRD and Raman studies.