Lattice distortion in thin films of IVB metal (Ti, Zr, Hr) nitrides

Goldfarb, Igor; Pelleg, Joshua; Zevin, L.; Croitoru, N.

doi:10.1016/0040-6090(91)90034-u

Cited by 58 publications

(18 citation statements)

References 10 publications

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“…Thin films deposited by sputtering have high defects concentration, which causes crystal lattice distortion and promotes the (111) preferred orientation due to deformation energy minimization 20,21 . Grains with (111) orientation grow in the normal direction to the film plane, which contributes to the formation of a columnar microstructure, while (200) grains grow in the parallel direction, having the potential to change the columnar morphology to a non columnar one 22 .…”

Section: Resultsmentioning

confidence: 99%

Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

et al. 2015

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Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si 3 N 4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.

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Section: Resultsmentioning

confidence: 99%

Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

et al. 2015

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“…A c c e p t e d M a n u s c r i p t 7 was observed in CrSiN-2 [10,23]. Both substitutional and interstitial of non-stoichiometric Si atoms in the CrN lattice suggests solid solution of Si in CrN.…”

Section: Page 8 Of 30mentioning

confidence: 91%

“…It is also known that the intake of non-stoichiometric atoms in nitride films of transition metals is grain orientation dependent [23]. It was shown from the TEM diffraction patterns that CrSiN-2 exhibits smaller grains in a more random orientation compared to the sample having a lower Si content (CrSiN-1).…”

Section: Effect Of Si Content On Residual Stress In the Coatingsmentioning

confidence: 93%

Factors governing the mechanical behaviour of CrSiN coatings: Combined nanoindentation testing and transmission electron microscopy

Wo¹,

Munroe²,

Li³

et al. 2012

Materials Science and Engineering: A

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A c c e p t e d M a n u s c r i p t Highlights for manuscript "Factors governing the mechanical behaviour of CrSiN coatings: combined nanoindentation testing and transmission electron microscopy":  Influence of Si in CrSiN coatings on microstructure and mechanical behaviour. XTEM observation of microstructure before and after nanoindentation. Microstructure, residual stress, hardness are affected by Si content. Deformation mechanisms operated in the coatings explain their mechanical behaviour. *Highlights

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“…It means that the nanorod structure is favorable for the growth along the [110] direction. The thermodynamic model is generally used to explain the preferential growth direction of the films [28]. In the thermodynamic model, it has been established that the growth orientation in thin films is obtained at the thermodynamic equilibrium, which will be reached when the total energy -the sum of surface energy and deformation energy -of the system substrate-film has a minimum.…”

Section: Resultsmentioning

confidence: 99%

Preparation and characterization of dye-sensitized TiO2 nanorod solar cells

Chen

et al. 2015

Thin Solid Films

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TiO 2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensitized solar cells (DSSCs). The length of the TiO 2 nanorods was varied from 1 μm to 6 μm. The scanning electron microscopy images show that the nanorods are perpendicular to the substrate. Both the X-ray diffraction patterns and Raman scattering results show that the nanorods have an anatase phase; no other phase has been observed. (101) and the (220) diffraction peaks have been observed for the TiO 2 nanorods. The (101) diffraction peak intensity remained constant despite the increase of nanorod length, while the intensity of the (220) diffraction peak increased almost linearly with the nanorod length. These nanorods were used as the working electrodes in DSSCs and the effect of the nanorod length on the conversion efficiency has been studied. An optimum photoelectric conversion efficiency of 4.8% has been achieved for 4 μm length nanorods.

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Lattice distortion in thin films of IVB metal (Ti, Zr, Hr) nitrides

Cited by 58 publications

References 10 publications

Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

Factors governing the mechanical behaviour of CrSiN coatings: Combined nanoindentation testing and transmission electron microscopy

Preparation and characterization of dye-sensitized TiO2 nanorod solar cells

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