Latest results from the Nikon NSR-S620 double patterning immersion scanner

Hirano, Kazuyuki; Shibazaki, Yuichi; Hamatani, Masato; Ishikawa, Jun; Iriuchijima, Yasuhiro

doi:10.1117/12.837037

Cited by 4 publications

(4 citation statements)

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“…The uniform distribution of DOP across the pupil plane doesn't exist neither 5,6 . Because of the limitation of manufacture and control technology, the DOP on each small area on pupil plane is not equal to the value of its adjacent regions.…”

Section: Modeling and Methodologymentioning

confidence: 91%

Impact of non-uniform polarized illumination on hyper-NA lithography

Guo

2012

SPIE Proceedings

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Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

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Section: Modeling and Methodologymentioning

confidence: 91%

Impact of non-uniform polarized illumination on hyper-NA lithography

Guo

2012

SPIE Proceedings

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“…Compared with laser interferometers, grating interferometers [10,11] have better immunity to air refractive index changes. As shown in Figure 1, raster interferometers have been used in lithography as an alternative to laser interferometers to detect critical platform motion in wafer exposure [12,13] . In the realization of multi-degree-of-freedom displacement measurement in free space, grating interferometer plays an important and irreplaceable role.…”

Section: Large Size Diffraction Gratingmentioning

confidence: 99%

Research on automatic detection method for surface defects of large-size gratings

Xu,

Li,

Zhang

et al. 2023

Holography, Diffractive Optics, and Applications XIII

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“…In the Streamlign platform, the reticle stage, wafer stage, and the projection lens are protected from vibrations by an effective isolation structure, which includes reticle stage isolation and Sky Hook isolation [1] . Regarding motion control, we introduced a new method called Multi-shot Iterative Learning Control (MILC) [5] , which can reduce errors in the stage trajectory by iterative motion learning. Moreover, to improve CDU, we introduced a new system called CDU Master [6] , which is the dose and focus optimization from CDU scatterometry results.…”

Section: Cdu : Line 25 Space 33 (3σ [Nm])mentioning

confidence: 99%

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

et al. 2010

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Currently, it is considered that one of the most favorable options for the 32 nm HP node is pitch-splitting double patterning, which requires the lithography tool to achieve high productivity and high overlay accuracy simultaneously. In the previous work [1] , we described the concepts and the technical features of Nikon's immersion scanner based on our newly developed platform, Streamlign, designed for 2nm overlay, 200wph throughput, and short setup time. In this paper, we present the latest actual performance of S620D with the Streamlign platform.Owing to the high repeatability of our new encoder metrology system, Bird's Eye Control, and Stream Alignment, S620D achieves less than 2 nm overlay accuracy, less than 15nm focus accuracy, and successful 32 and 22 nm L/S pitchsplitting double patterning exposures. Furthermore, the results at high scanning speed up to 700 mm/s are fine and we have successfully demonstrated over 4,000 wpd throughput, which confirms the potential for high productivity. Nikon has developed this Streamlign as an optimized long life platform based on the upgradable Modular 2 structure for upcoming generations. The performance of S620D indicates the possibility of immersion extension down through the 22 nm HP node and beyond.

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Latest results from the Nikon NSR-S620 double patterning immersion scanner

Cited by 4 publications

References 0 publications

Impact of non-uniform polarized illumination on hyper-NA lithography

Impact of non-uniform polarized illumination on hyper-NA lithography

Research on automatic detection method for surface defects of large-size gratings

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

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