1995
DOI: 10.1063/1.115504
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Lateral quantization effects in lithographically defined CdZnSe/ZnSe quantum dots and quantum wires

Abstract: Quantum dots and quantum wires based on CdZnSe/ZnSe single quantum well heterostructures have been achieved using electron beam lithography and wet chemical etching. Photoluminescence spectra of the dot and wire structures show a blue shift due to lateral quantization for lateral dimensions below 40 nm. For the dot ground state, a lateral confinement energy of 16 meV is obtained for 28 nm diameter structures. For wires with widths on the order of 20 nm, lateral confinement energies of about 5 meV are observed.… Show more

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Cited by 62 publications
(25 citation statements)
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“…In order to suppress any influence of spatial diffusion of excitons, quantum dots were fabricated by electron beam lithography and wet chemical etching using a K 2 Cr 2 O 7 : HBr : H 2 O solution. This technique ensures quantum dots of high optical quality with a lateral extension of 35 nm [4]. In Fig.…”
Section: Resultsmentioning
confidence: 99%
“…In order to suppress any influence of spatial diffusion of excitons, quantum dots were fabricated by electron beam lithography and wet chemical etching using a K 2 Cr 2 O 7 : HBr : H 2 O solution. This technique ensures quantum dots of high optical quality with a lateral extension of 35 nm [4]. In Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Comparing the average number of peaks per spectrum with the 2.5x10" cm2 excitation spot, we conclude that the excitons giving rise to this emission are confined in an area scaling with the exciton Bohr radius (5 tim). This is markedly smaller than the characteristic dimensions of(Zn,Cd)Se quantum dots defined by lithography and etch techniques [8]. Xin et al [9] have reported on the molecular beam epitaxial growth of self-assembled Il-VI dots of pure CdSe and succeeded to image these dots directly by AFM.…”
Section: Growfh and Characterizationmentioning
confidence: 99%
“…Usually, the pattern defined by lithography is transferred into the semiconductor by wet or dry etching techniques and a variety of processes have been developed for II-VI materials. 5,[9][10][11] However, this technique suffers from the formation of etched sidewalls, where usually nonradiative recombination occurs. This reduces the quantum efficiency in quantum wires and dots 5 as well as in laser diodes.…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8][9] This is a consequence of the feasibility of lithographic techniques to design not only the lateral size and shape of the micro-and nanostructures, but also to define periodic or laterally ordered structures. Usually, the pattern defined by lithography is transferred into the semiconductor by wet or dry etching techniques and a variety of processes have been developed for II-VI materials.…”
Section: Introductionmentioning
confidence: 99%