Laser-solid interaction and dynamics of laser-ablated materials

Chen, Kuan-Ren; Leboeuf, J. N.; Wood, R. F.; Geohegan, David B.; Donato, J. M.; Liu, C. L.; Puretzky, Alexander A.

doi:10.1016/0169-4332(95)00463-7

Cited by 38 publications

(6 citation statements)

References 6 publications

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“…The electron temperature is in the range of 1-5 eV, and the ion temperature has nearly the same order of magnitude as the electron temperature. However, since the plasma formation area in front of the target is very small and the plasma flux velocity is very large, the formation of a large area uniform laser plasma tends to be difficult in practice [34]. …”

Section: à2mentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,403

652

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Plasma-surface modification (PSM) is an effective and economical surface treatment technique for many materials and of growing interests in biomedical engineering. This article reviews the various common plasma techniques and experimental methods as applied to biomedical materials research, such as plasma sputtering and etching, plasma implantation, plasma deposition, plasma polymerization, laser plasma deposition, plasma spraying, and so on. The unique advantage of plasma modification is that the surface properties and biocompatibility can be enhanced selectively while the bulk attributes of the materials remain unchanged. Existing materials can, thus, be used and needs for new classes of materials may be obviated thereby shortening the time to develop novel and better biomedical devices. Recent work has spurred a number of very interesting applications in the biomedical field. This review article concentrates upon the current status of these techniques, new applications, and achievements pertaining to biomedical materials research. Examples described include hard tissue replacements, blood contacting prostheses, ophthalmic devices, and other products. #

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Section: à2mentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,403

652

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“…The first one consists of an intense and narrow peak caused by the interaction at the shock front and thus marks the boundary between the plasma region and background gas. 10 The second one is considerably broader and caused by the species ejected from the target at later times. As the delay is increased ͓Figs.…”

mentioning

confidence: 99%

Imaging the dissociation process of O2 background gas during pulsed laser ablation of LiNbO3

Epurescu

Siegel

Gonzalo

et al. 2005

Applied Physics Letters

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The dynamics and the reactivity of the plasma produced during pulsed laser ablation of LiNbO3 have been investigated. Optical emission spectroscopy combined with time-gated imaging with high spatial resolution is applied to the study of the factors that influence the plasma expansion process, the dynamics of the ejected species the influence of a background atmosphere (O2 and Ar) and the reactivity of the expanding plasma. Direct evidence for O2 dissociation occurring during expansion is presented and the temporal evolution of the spatial distribution of the dissociated O2 is studied in detail. The influence of dissociation and velocities of the ablated species on the quality of thin films grown by pulsed laser deposition are discussed.

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“…Clustering when vapor plume expands into a background oxygen gas, collisions may cause atoms and ions in the plume to coalesce into nm-scale clusters [25]. On the other hand, the roughness starts to decrease after reaching the maximum value, as increasing the number of laser pulses thermal energy of the vapor above the target will increase and hence the plume expands and compresses the background gas, creating a shock-wave which slows the plume expansion [23,26]. As in this work where the targetto-substrate distance is too close, the expanding vapor reaches the substrate with typical energies of 0.1-100 eV per atom [27], depositing sub-monolayer thicknesses of material per pulse.…”

Section: Resultsmentioning

confidence: 99%

The Influence of the Number of Laser Pulses on the Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition

Salih¹

2019

AJPST

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In this work Titanium Dioxide thin films were fabricated by pulsed laser deposition technique (PLD) using a Qswitched Nd: YAG laser. Titanium dioxide powder, in the Anatase form, was compressed to form solid disks. Each of these disks was irradiated with different number of laser pulses (5, 10 and 15 pulses) with the same pulse energy (150 mJ) and same Repetition rate (10 Hz). The thickness and topography of each deposited thin films were characterized using atomic force microscopy (AFM). The results showed that the thickness of the film increase exponentially when the number of laser pulses increased. The results showed also that the average roughness (Ra) of the films and the root means square roughness (RMS) increased with increasing the number of pulses exponentially to specific value and then decreased exponentially in a behavior like the Gaussian shape.

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Laser-solid interaction and dynamics of laser-ablated materials

Cited by 38 publications

References 6 publications

Plasma-surface modification of biomaterials

Plasma-surface modification of biomaterials

Imaging the dissociation process of O2 background gas during pulsed laser ablation of LiNbO3

The Influence of the Number of Laser Pulses on the Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition

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Laser-solid interaction and dynamics of laser-ablated materials

Cited by 38 publications

References 6 publications

Plasma-surface modification of biomaterials

Plasma-surface modification of biomaterials

Imaging the dissociation process of O2 background gas during pulsed laser ablation of LiNbO3

The Influence of the Number of Laser Pulses on the Thickness and Roughness of TiO&lt;sub&gt;2&lt;/sub&gt; Thin Films Fabricated Using Pulsed Laser Deposition

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The Influence of the Number of Laser Pulses on the Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition