Laser Photolysis Formation of Gold Colloids in Block Copolymer Micelles

Bronstein, Lyudmila M.; Chernyshov, Dmitrii M.; Valetsky, Pyotr M.; Tkachenko, Nikolay V.; Lemmetyinen, Helge; Hartmann, Jürgen; Förster, Stephan

doi:10.1021/la980868r

Cited by 68 publications

(62 citation statements)

References 28 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Poly(2-or 4-vinyl pyridine) (PVP) block copolymers are particularly able to complex with many metal salts due to the presence of the nitrogen in either the two or four position of the aromatic ring. Solution phase routes for fabricating palladium [34], cobalt [35], gold [36], rhodium [37], and platinum nanoclusters [37] in the P4VP core of a PS-b-P4VP block copolymer micelle by the reduction of a metal(CH 3 COO) 2 have been investigated for catalysis applications. Using a similar method which eliminates high-temperature heating steps, Ahmed et al have made very regular CoFe 2 O 4 nanoparticles which are ferrimagnetic at room temperature [38].…”

Section: Incorporation Of Nanocrystals and Nanoreactorsmentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

View full text Add to dashboard Cite

The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a variety of new applications. For example, the uniformly sized and shaped nanodomains formed in the films have been used for nanolithography, nanoparticle synthesis, and high-density information storage media. Imperative to all of these applications, however, is a high degree of control over orientation of the nanodomains relative to the surface of the film as well as control over order in the plane of the film. Induced fields including electric, shear, and surface fields have been demonstrated to influence orientation. Both heteroepitaxy and graphoepitaxy can induce positional order on the nanodomains in the plane of the film. This article will briefly review a variety of mechanisms for gaining control over block copolymer order as well as many of the applications of these materials. Particular attention is paid to the potential of perfecting long-range two-dimensional order over a broader range of length scales and the extension of these concepts to functional materials and more complex architectures. #

show abstract

Section: Incorporation Of Nanocrystals and Nanoreactorsmentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

View full text Add to dashboard Cite

show abstract

“…[178] Doping of micelles formed from PS-b-P2VP and PS-b-P4VP has been used to prepare a variety of metal clusters through chemical reduction with examples including Pd, Co, Au, Rh, and Pt nanoparticles produced in PS-b-P4VP micelles in toluene. [188][189][190] In a similar fashion encapsulated quantum dots have been prepared [191] and PS-b-PEO diblock micelles used to produce various metal clusters. [192,193] Although major interest for the metal solution process coding are focused on bulk or micelles of BCPs, [194][195][196][197][198][199] a number of studies demonstrate the significant potential of this process.…”

Section: Nanoparticle Decoration In Preferential Domainsmentioning

confidence: 99%

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

et al. 2009

View full text Add to dashboard Cite

show abstract

“…[34] In solid-state host materials, such as homopolymers, [35] blend polymers, [36] polymer micelles, [37] polymer gels, [38] or DNA, [39] even successfully fabricated metal NPs have nearly similar sizes, but in most cases they are coagulated or randomly dispersed with uncontrollable interparticle distances. Recently, block copolymer micelles, either in solution [40] or as a thin film on a substrate, [26] have been templated to prepare metal NP arrays. The preparation was driven by a VUV excimer laser, where the laser was employed to reduce metal cations and remove the copolymer template.…”

mentioning

confidence: 99%

“…However, following this step, the obtained NP array no longer resembled the copolymer micelle template. [26,40] To the best of our knowledge, photochemical fabrication has not been reported as a method for directly depositing a regularly arranged, 'naked' metal-NP array onto a solid substrate by using a bulk block copolymer film as a template. Unlike a copolymer micelle film, a bulk block copolymer film has the advantage of simpler experimental processing and wider applicability.…”

mentioning

confidence: 99%

Template‐ and Vacuum‐Ultraviolet‐ Assisted Fabrication of a Ag‐Nanoparticle Array on Flexible and Rigid Substrates

Kamata

Watanabe

et al. 2007

Advanced Materials

View full text Add to dashboard Cite

The fabrication of well-ordered metal-nanoparticle (NP) arrays on either rigid or flexible substrates is of considerable interest in modern science and technology for applications as diverse as electronics, photonics, informatics, sensors, and catalysis.[1] For example, nanofabrication on optically transparent flexible substrates is spawning novel and unique applications, including plastic electronics and organic light-emitting displays.[2] A template-assisted nanofabrication strategy based on self-assembled nanostructures is one promising method for macroscopically manipulating nanopatterned surfaces for practical applications. [1][2][3][4][5][6][7][8][9] Among the potential self-assembled templates, phase-segregated block copolymers have drawn much attention because they can give rise to tunable periodic nanostructures with various geometries. [3][4][5][6][7][8][9][10] Many approaches, including physical vapor deposition, [11,12] chemical vapor deposition, [13][14][15] electroless deposition, [16,17] galvanic displacement, [18,19] electrochemical plating, [20,21] sol-gel chemistry, [22] chemical reduction, [23] and pyrolysis, [24] have been widely explored as options for arranging metal NPs onto robust substrates by using a block copolymer template. For example, very recently our group has demonstrated that Au NPs can be assembled via a site-specific recognition between hydrophilic/ hydrophobic NPs and the nanodomains of phase-segregated, amphiphilic, diblock copolymer films. [25] In contrast, a novel hybrid nanofabrication process, block copolymer lithography, [26][27][28][29][30][31][32] has recently been extensively investigated because it successfully combines advantages of both the top-down (lithography) and bottom-up (block copolymer template) techniques, where high-energy irradiation, such as laser, [26] plasma, [27][28][29] electron beam, [30] or ion beam, [31,32] has been utilized to both generate periodic arrays of nano-objects and remove the copolymer template in a single step. [3][4][5][6][7][8][9] Unfortunately, less attention has been paid to the site-selective metallization of long-range-ordered nanostructures on optically transparent polymer substrates, potentially leading to flexible electronic and photonic devices beyond conventional Si-based technology.[1] A further challenge is to develop a versatile procedure for efficient nanostructure fabrication on both soft and hard substrates.[2] Herein, we demonstrate the simple but widely applicable vacuum ultraviolet (VUV)-assisted nanofabrication of a hexagonally arranged, high-density Ag-NP array with a tunable interparticle distance on either a rigid or flexible substrate over a large area. The key to the nanofabrication process described here is that the VUV irradiation drives both the photoreduction of the selectively infiltrated Ag + to metallic Ag NPs and the etching of the template of the copolymer film in one step. It is well known that Ag + can be photochemically reduced in the presence of an appropriate electron donor, [33] and this appro...

show abstract

Laser Photolysis Formation of Gold Colloids in Block Copolymer Micelles

Cited by 68 publications

References 28 publications

Patterning with block copolymer thin films

Patterning with block copolymer thin films

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Template‐ and Vacuum‐Ultraviolet‐ Assisted Fabrication of a Ag‐Nanoparticle Array on Flexible and Rigid Substrates

Contact Info

Product

Resources

About