Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface

Popovici, Dumitru; Czeremuzkin, G.; Meunier, Michel; Sacher, E.

doi:10.1016/s0169-4332(98)00009-9

Cited by 14 publications

(25 citation statements)

References 13 publications

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“…The trend of the quantitative analysis of the different contributions in the region is in good correspondence with the calculated ones (see table S5). The C 1s region shows a fine structure that can be clearly assigned to the different carbon atoms according to previous reports on similar complexes [46,54]: at high Binding Energy (BE), well separated with respect to the others, a peak attributable to the fluorinated carbon (-CF3) atoms centered at 291.8 eV can be identified. The peak at 286.4 eV is due to the contributions of the ketonic carbon atoms (C=O) and the carbon bound to with nitrogen.…”

Section: Deposition and Chemical Characterization Of The Dypyno-no2 Filmsupporting

confidence: 57%

Chemical tailoring of Single Molecule Magnet behavior in films of Dy(III) dimers

Cimatti

Sessoli

et al. 2018

Applied Surface Science

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International audienceThe insertion of Single Molecule Magnets (SMMs) in spintronic devices has drawn much attention thanks to their fascinating quantum and classical magnetic properties. Although many efforts have been done in this direction, we are still in search of optimal molecules, which preserve intact the magnetic bistability at the nanoscale. In this frame, we have synthesized a new dysprosium-based dimer characterized by SMM behavior and a double-butterfly-shape hysteresis. The complex has been successfully deposited by sublimation in high vacuum and the peculiar SMM behavior of the complex is fully retained at the nanoscale demonstrating that a modification of the dimer structure aimed for enhancing the SMM character is compatible with nanostructuration purposes

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Section: Deposition and Chemical Characterization Of The Dypyno-no2 Filmsupporting

confidence: 57%

Chemical tailoring of Single Molecule Magnet behavior in films of Dy(III) dimers

Cimatti

Sessoli

et al. 2018

Applied Surface Science

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“…hfacH adsorption onto a clean cobalt surface does result chemisorption; however, the only surface reaction pathway for hfac on a clean cobalt surface is decomposition. In C 1s spectra summarized in Figure 4, when hfacH adsorbs on cobalt surfaces at room temperature, the binding energies corresponding to CF 3 (292.6 eV), C=O (288.5 eV) and C-H (284.6 eV) [41] were observed. Unfortunately, since the XPS studies are conducted following by a brief exposure of the samples to ambient conditions upon transfer, quantification or correct assignment of all the observed features is difficult because of possible contamination.…”

Section: Resultsmentioning

confidence: 99%

Surface chemistry of thermal dry etching of cobalt thin films using hexafluoroacetylacetone (hfacH)

Zhao

Konh

Teplyakov

2018

Applied Surface Science

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Amechanism of thermal dry etching process of cobalt thin films by using 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (hexafluoroacetylacetone, hfacH) was investigated. This process, relevant to atomic layer etching (ALE) technology directed towards oxidized cobalt films, requires adsorption of molecular organic precursor, such as hfacH, at moderate temperatures and is often thought of as releasing water and Co(hfac) at elevated temperatures. The reaction was analyzed in situ by temperature-programmed desorption (TPD) and the resulting surface was investigated ex situ by X-ray photoelectron spectroscopy (XPS). The changes in surface morphology during the process were monitored by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The removal of Co(hfac) from the surface was observed above 650 K, a temperature well above commercially desired etching conditions, suggesting that the thermal etching process is more complex than originally envisioned. In addition, the upper limit of thermal treatment is established at 800 K, as the microscopic techniques clearly indicated surface morphology changes above this temperature. In addition, the structure of the surface at the nanoscale is observed to be affected by the presence of surface bound organic ligands even at room temperature. Thus, further mechanistic studies should address the kinetic regime and surface morphology to make inroads into mechanistic understanding of the dry etching process.

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“…Peak deconvolution (using Gaussian model) of the carbon spectra was carried out for determining the functional components of the solid deposition. The analytical results show the possible existence of C C bond (binding energy: 285.65 eV) and C H bond (binding energy: 286.45 eV) [19][20][21][22], and the ratio of C C bond to C H bond is approximately 1.4 to 1; whereas, in the C 6 H 6 /O 2 /Ar system, the binding energy for C C and C H bond was 285.6 and 286.7 eV, respectively, [19][20][21][22], and the ratio was 6.3 to 1.0.…”

Section: Formation Of Solid Depositionsmentioning

confidence: 99%

Decomposition of benzene in the RF plasma environmentPart I. Formation of gaseous products and carbon depositions

Shih

Lin

Shih

2004

Journal of Hazardous Materials

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Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface

Cited by 14 publications

References 13 publications

Chemical tailoring of Single Molecule Magnet behavior in films of Dy(III) dimers

Chemical tailoring of Single Molecule Magnet behavior in films of Dy(III) dimers

Surface chemistry of thermal dry etching of cobalt thin films using hexafluoroacetylacetone (hfacH)

Decomposition of benzene in the RF plasma environmentPart I. Formation of gaseous products and carbon depositions

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