Laser induced forward transfer: The effect of support-film interface and film-to-substrate distance on transfer

Kántor, Z.; Tóth, Z.; Szörényi, T.

doi:10.1007/bf00323905

Cited by 54 publications

(15 citation statements)

References 9 publications

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“…9 For a fundamental understanding of the underlying physical mechanisms of the transfer process, several different one dimensional models were developed to calculate the temperature profile in the metal layer. [10][11][12] The temperature profiles suggest that evaporating metal at the glass/metal interface transfers the metal to the substrate. Unfortunately, these models did not take into account the evaporation of the glass support as well as the arising gas pressures at the interface.…”

mentioning

confidence: 98%

Physical model for the laser induced forward transfer process

Roder

Köhler

2012

Applied Physics Letters

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This paper presents a numerical model which describes the underlying physical processes during laser induced forward transfer. The laser induced forward transfer uses a pulsed laser to transfer thin layers from a transparent support to a substrate. The model predicts the threshold energies Eth as well as the blow-off time tblow, thus allowing a profound physical understanding of the transfer process. The good agreement of simulated with measured Eth and tblow of thin nickel layers demonstrates the accuracy of the model. The model shows that gasification of the soda-lime glass support is the main driving force of the transfer process.

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mentioning

confidence: 98%

Physical model for the laser induced forward transfer process

Roder

Köhler

2012

Applied Physics Letters

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“…There is some work on patterning of tin oxide thin films [3] or of TiN coatings for tribological applications [4]. Several authors describe various aspects of laser induced forward transfer (LIFT) [5][6][7]. But using this technique not the patterned original layer is of interest, but the transferred fragments.…”

Section: Introductionmentioning

confidence: 98%

Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements

Ihlemann

Schaefer

2003

Micromachining Technology for Micro-Optics and Nano-Optics

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Excimer laser ablation is a versatile method to generate three dimensional microstructured devices for mechanics, fluidics and optics. Especially, if in one dimension the structure is predefined by a layer design, and the other two dimensions are defined in the layer ablation process by mask projection, very precise structure definition in three dimensions and ablated surfaces with optical quality can be achieved. Patterning optical layers or layer stacks, a variety of applications is possible. As examples the fabrication of dielectric masks and diffractive optical elements and the performance of these elements in shaping excimer laser beams are demonstrated.

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“…4 Several authors describe various aspects of laser-induced forward transfer ͑LIFT͒. [5][6][7] But using this technique, not the patterned original layer but the transferred fragments are of interest. Metal film removal was investigated in the early time of laser ablation.…”

Section: Introductionmentioning

confidence: 99%

Patterning of optical coatings by laser ablation for the fabrication of dielectric masks and diffractive phase elements

Ihlemann

2004

J. Micro/Nanolith. MEMS MOEMS

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Excimer laser ablation is a versatile method to generate 2-or 3-D microstructured devices for mechanics, fluidics, and optics. Particularly, if in 1-D the structure is predefined by a layer design, and the other two dimensions are defined in the layer ablation process by mask projection, very precise structure definition in three dimensions and ablated surfaces with optical quality can be achieved. By patterning optical layers or layer stacks, a variety of applications is possible. Two examples are demonstrated. 1. Dielectric masks (amplitude masks) are fabricated by structuring a highly reflective dielectric layer stack. These masks can be used in high power laser machining systems. 2. Diffractive optical elements (phase elements) are generated by structured ablation of a transparent layer. The performance of these elements in shaping excimer laser beams is demonstrated. © 2004 Society of Photo-Optical Instrumentation Engineers.

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Laser induced forward transfer: The effect of support-film interface and film-to-substrate distance on transfer

Cited by 54 publications

References 9 publications

Physical model for the laser induced forward transfer process

Physical model for the laser induced forward transfer process

Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements

Patterning of optical coatings by laser ablation for the fabrication of dielectric masks and diffractive phase elements

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