2015
DOI: 10.1016/j.optlaseng.2015.04.003
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Laser direct patterning of AgNW/CNT hybrid thin films

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Cited by 28 publications
(16 citation statements)
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“…However, the majority of conventional methods share a common issue that a large amount of AgNWs was wasted for the patterning process. During the photolithography 34 , 35 and laser ablation process 36 , 37 , unused AgNWs were discarded with an etchant or high-energy laser. Dip coating and spray coating 38 41 with a stencil mask resulted in the deposition of AgNWs on not only the uncovered substrate but also the stencil mask, which would be removed after the patterning process.…”
Section: Introductionmentioning
confidence: 99%
“…However, the majority of conventional methods share a common issue that a large amount of AgNWs was wasted for the patterning process. During the photolithography 34 , 35 and laser ablation process 36 , 37 , unused AgNWs were discarded with an etchant or high-energy laser. Dip coating and spray coating 38 41 with a stencil mask resulted in the deposition of AgNWs on not only the uncovered substrate but also the stencil mask, which would be removed after the patterning process.…”
Section: Introductionmentioning
confidence: 99%
“…Yoon, J.W. et al [18] used a femtosecond laser to process a thin film of silver nanowires and CNTs. The edge of the cutting position is not uniform due to the different thresholds of Ag and CNTs, but it can be reduced by laser beam shaping in the edge deformation zone of the composite film.…”
Section: Introductionmentioning
confidence: 99%
“…Alternatively, fabrication techniques of AgNW patterns directly on the target substrate have also been developed using microfluidic processing technique, microchannel wetting, and laser direct patterning . The microfluidic processing technique using microfluidic channels and thermal annealing gradients is rapid and economical way to fabricate AgNW patterns, which is however hard to fabricate AgNW patterns in tens of micrometers.…”
Section: Introductionmentioning
confidence: 99%
“…24−26 For transfer printing of AgNWs, the patterned PDMS stamp, 24 and patterned/aligned AgNW sheet on the PDMS stamp with meniscus-dragging deposition 25 and reconfigurable topographic substrates 26 Alternatively, fabrication techniques of AgNW patterns directly on the target substrate have also been developed using microfluidic processing technique, 27 microchannel wetting, 28 and laser direct patterning. 29 The microfluidic processing technique using microfluidic channels and thermal annealing gradients is rapid and economical way to fabricate AgNW patterns, which is however hard to fabricate AgNW patterns in tens of micrometers. On the other hand, the microchannel wetting and laser direct patterning methods can achieve micrometer-sized AgNW patterns but are hardly applicable for wafer-scale fabrication due to the cost, time, and yield.…”
Section: ■ Introductionmentioning
confidence: 99%