2014
DOI: 10.1021/am501161j
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Large Scale and Orientation-Controllable Nanotip Structures on CuInS2, Cu(In,Ga)S2, CuInSe2, and Cu(In,Ga)Se2 by Low Energy Ion Beam Bombardment Process: Growth and Characterization

Abstract: One-step facile methodology to create nanotip arrays on chalcopyrite materials (such as CuInS2, Cu(In,Ga)S2, CuInSe2, and Cu(In,Ga)Se2) via a low energy ion beam bombardment process has been demonstrated. The mechanism of formation for nanotip arrays has been proposed by sputtering yields of metals and reduction of metals induced by the ion beam bombardment process. The optical reflectance of these chalcopyrite nanotip arrays has been characterized by UV-vis spectrophotometer and the efficient light-trapping e… Show more

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Cited by 6 publications
(2 citation statements)
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“…As a matter of fact, the study of MA in such thin films is a striking topic and in particular, in-plane UMA induced by nanoscale-patterned morphology is a topic of current interest in spintronics. In this regard, the oblique incidence ion beam erosion (IBE) process has been demonstrated to be a handy and powerful tool to induce self-organized nanoscale morphological structures on the substrates ,, as well as 2D thin-film surfaces. ,, In the literature, the oblique incidence IBE process has been used extensively to form nanometer-scale ripple patterns on the surfaces. Depending on surface temperature and ion incidence angles, theses ripples are found to be aligned parallel or perpendicular with respect to the IBE direction. , Magnetic thin films with such a microstructure reveal a pronounced UMA with an easy axis of magnetization along the direction of ripples , on the surface.…”
Section: Introductionmentioning
confidence: 99%
“…As a matter of fact, the study of MA in such thin films is a striking topic and in particular, in-plane UMA induced by nanoscale-patterned morphology is a topic of current interest in spintronics. In this regard, the oblique incidence ion beam erosion (IBE) process has been demonstrated to be a handy and powerful tool to induce self-organized nanoscale morphological structures on the substrates ,, as well as 2D thin-film surfaces. ,, In the literature, the oblique incidence IBE process has been used extensively to form nanometer-scale ripple patterns on the surfaces. Depending on surface temperature and ion incidence angles, theses ripples are found to be aligned parallel or perpendicular with respect to the IBE direction. , Magnetic thin films with such a microstructure reveal a pronounced UMA with an easy axis of magnetization along the direction of ripples , on the surface.…”
Section: Introductionmentioning
confidence: 99%
“…It consists in irradiating a solid target with a broad ion beam impinging under a well-defined incidence angle θ to the surface normal [9,10]; this erodes material out, surprisingly inducing nanoscale surface ripples, as experimentally found quite early on [11,12]. * jamunoz@math.uc3m.es To date, these nanopatterns have found a large number of applications for, e.g., optoelectronics [13,14], photovoltaics [15], nanolithography [16,17], biomedicine [18,19], or the synthesis of novel structures [20] and materials [21], holding potential for many other [7].…”
Section: Introductionmentioning
confidence: 99%