2016
DOI: 10.1007/s00339-015-9589-y
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Large arrays of ultra-high aspect ratio periodic silicon nanowires obtained via top–down route

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Cited by 12 publications
(8 citation statements)
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“…In general, these approaches can be categorized as top-down and bottom-up techniques. Top-down techniques, such as electron beam (E-beam) lithography, focused-ion beam and photon lithography, nanoindentation, and metal-induced chemical etching, can fabricate well-controlled nanoscale patterns, and they are promising techniques for fabricating SERS-active substrates (Figure a). These approaches have difficulty in fabricating sub-5 nm structures (the size of a typical SERS hotspot is approximately 2 nm); however, the main challenges of top-down nanotechnology lie in the high technique barrier involved, low fabrication speed, and extremely high production cost, limiting their practical applications.…”
Section: Challenges In Real-life Sers Applicationsmentioning
confidence: 99%
See 1 more Smart Citation
“…In general, these approaches can be categorized as top-down and bottom-up techniques. Top-down techniques, such as electron beam (E-beam) lithography, focused-ion beam and photon lithography, nanoindentation, and metal-induced chemical etching, can fabricate well-controlled nanoscale patterns, and they are promising techniques for fabricating SERS-active substrates (Figure a). These approaches have difficulty in fabricating sub-5 nm structures (the size of a typical SERS hotspot is approximately 2 nm); however, the main challenges of top-down nanotechnology lie in the high technique barrier involved, low fabrication speed, and extremely high production cost, limiting their practical applications.…”
Section: Challenges In Real-life Sers Applicationsmentioning
confidence: 99%
“…Highly ordered rigid SERS substrates fabricated by different methods: (a) top-down fabrication, (b) bottom-up assembly, and (c) template-assisted fabrication. Copyright with the permission from refs (Copyright 2014 American Chemical Society), (Copyright 2016 American Chemical Society), (Copyright 2012 American Chemical Society), (Copyright 1998 Elsevier), (Copyright 2016 Royal Society of Chemistry), (Copyright 2012 American Chemical Society), (Copyright 2016 Springer), (Copyright 2017 American Chemical Society), (Copyright 2015 American Chemical Society), (Copyright 2004 Royal Society of Chemistry), (Copyright 2016 American Chemical Society), (Copyright 2016 American Chemical Society), (Copyright 2013 Royal Society of Chemistry), (Copyright 2013 Wiley), (Copyright 2017 MDPI), (Copyright 2010 American Chemical Society), (Copyright 2015 American Chemical Society), (Copyright 2009 American Chemical Society), and (Copyright 2015 Wiley).…”
Section: Challenges In Real-life Sers Applicationsmentioning
confidence: 99%
“…Several methods have been developed for the fabrication of SERS substrates that follow either the top-down or bottom-up strategies. The top-down approach uses micro- and nanofabrication techniques, such as electron-beam lithography (EBL), , atomic layer deposition (ALD), , laser interference lithography (LIL), and focused ion beam (FIB) milling; top-down substrates have been reported for the detection of cancer cells. , Bottom-up approaches rely on the chemical synthesis and self-assembly of nanoparticles for hot-spot formation, which offers a simpler, less time-consuming, and more cost-effective solution for SERS substrate preparation . It is accepted that the top-down strategy is suitable for fabricating uniform and reproducible substrates, whereas bottom-up methods produce areas of intense but not uniform hot-spots.…”
Section: Sers Fundamentalsmentioning
confidence: 99%
“…Among these methods, MACE is the simplest and most versatile one. It relies on catalyzed etching with assistance of a perforated metal template film (typically gold or silver) [25] or randomly distributed metallic nanoparticles (typically gold or silver) [26,27] spread on the Si-wafer. To date, studies have been focused on uniaxial load and have neglected the SiNWs response under isostatic pressure, which creates a load uniformly distributed on the sample surface.…”
Section: Introductionmentioning
confidence: 99%