Large Area Patterning of Nanoparticles and Nanostructures: Current Status and Future Prospects

Abstract

Nanoparticles possess exceptional optical, magnetic, electrical, and chemical properties. Several applications, ranging from surfaces for optical displays and electronic devices, to energy conversion, require large-area patterns of nanoparticles. Often, it is crucial to maintain a defined arrangement and spacing between nanoparticles to obtain a consistent and uniform surface response. In the majority of the established patterning methods, the pattern is written and formed, which is slow and not scalable. Some parallel techniques, forming all points of the pattern simultaneously, have therefore emerged. These methods can be used to quickly assemble nanoparticles and nanostructures on large-area substrates into well-ordered patterns. Here, we review these parallel methods, the materials that have been processed by them, and the types of particles that can be used with each method. We also emphasize the maximal substrate areas that each method can pattern and the distances between particles. Finally, we point out the advantages and disadvantages of each method, as well as the challenges that still need to be addressed to enable facile, on-demand largearea nanopatterning.

Moiré Modulation of Van Der Waals Potential in Twisted Hexagonal Boron Nitride

“…The modulation produces a local field nanopatterning with the periodicity and tunability of the moiré pattern. We can then foresee that moiré superlattices in insulating and semiconducting LMs could complement already known patterning techniques by lifting the requirement for any sample pretreatment, as for chemical-assisted patterning, 60 or the need for external fields, as in field-assisted patterning. 60 …”

Using Patterned Self-Assembled Monolayers to Tune Graphene–Substrate Interactions

“…Here, as described in the methods section, colloidal lithography was employed to create nanostructured surfaces using silica nanoparticles of 1.8, 0.5, and 0.2 μm in diameter to control the pattern pitch. Following assembly of these spheres into hexagonal patterns on the surface, , OTS SAMs formed in all of the exposed surfaces between the silica particles, which, when the silica particles are removed leaves open pores on the surface of ca. 2 nm in depth with periodic spacing defined by the particle diameter and assembly symmetry.…”

The Beginner's Guide to Chiral Plasmonics: Mostly Harmless Theory and the Design of Large‐Area Substrates

“…The success of colloidal lithography is therefore intimately linked to the ability to create colloidal monolayers with high precision and order over large areas. [155][156][157][158] While typical colloidal self-assembly uses polymer or silica colloidal particles to produce monolayers with hexagonal symmetry have long been estalbished, recent advances in colloidal self-assembly, [159] enable access to versatile lattice geometries, [160][161][162][163][164][165] large interparticle spacing, [165,166] or enhanced ordering. [158,167,168] Such particle masks improve the optical activity, or significantly alter the optical properties due to near-field and lattice coupling in the fabricated nanostructure arrays.…”