Large Area Growth of Silver and Gold Telluride Ultrathin Films via Chemical Vapor Tellurization

Abstract

Developing a method for the growth of ultrathin metal chalcogenides, potentially targeting the two-dimensional (2D) limit, has a pivotal impact on various nanotechnological device applications. Here, we employed a vapor deposition scheme, based on tellurization, to induce the heterogenous chemical reaction between solid Ag and Au precursors, in the form of ultrathin films, and Te vapors. We characterized the morphological and structural properties of the grown tellurides by using atomic force microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction techniques. The developed tellurization methodology provides a key advancement in the picture of growing ultrathin noble metal tellurides and holds great potential for applications in different technological fields.

Chemical vapor deposition growth of graphene and other nanomaterials with 3D architectures towards electrocatalysis and secondary battery-related applications

“…In addition, it is difficult to grow 3D transition metal ditellurides on NPG substrates due to the heterogeneous chemical reaction between tellurium and Au with the formation of noble metal tellurides. 70 Therefore, developing more candidate substrates that can maintain the integrity of 3D structures at a relatively high temperature is imperative to promote the growth of 3D TMDCs flakes. Inspired by the aforementioned substrates used for the growth of 3D graphene materials, various high melting inorganic oxide substrates ( e.g.…”