2016
DOI: 10.1088/2053-1591/3/6/065007
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Large-area few-layer MoS2deposited by sputtering

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Cited by 39 publications
(25 citation statements)
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“…E fb is identical for both the electrodes, which indicates that the MoS 2 does not impact the conduction type of Sb 2 Se 3 , and also suggests that MoS 2 decoration protects the Sb 2 Se 3 photocathode and the band bending is unaffected by it. Here, the CSS‐deposited pristine Sb 2 Se 3 and MoS 2 /Sb 2 Se 3 NR arrays have a higher E fb value than that reported for the thermally evaporated Sb 2 Se 3 film (e.g., 0.55 V) . The acceptor densities (see Supporting Information) estimated for pristine Sb 2 Se 3 and MoS 2 /Sb 2 Se 3 are ≈2.0×1016 and 5.6×1016 cm −3 , respectively.…”
Section: Resultsmentioning
confidence: 60%
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“…E fb is identical for both the electrodes, which indicates that the MoS 2 does not impact the conduction type of Sb 2 Se 3 , and also suggests that MoS 2 decoration protects the Sb 2 Se 3 photocathode and the band bending is unaffected by it. Here, the CSS‐deposited pristine Sb 2 Se 3 and MoS 2 /Sb 2 Se 3 NR arrays have a higher E fb value than that reported for the thermally evaporated Sb 2 Se 3 film (e.g., 0.55 V) . The acceptor densities (see Supporting Information) estimated for pristine Sb 2 Se 3 and MoS 2 /Sb 2 Se 3 are ≈2.0×1016 and 5.6×1016 cm −3 , respectively.…”
Section: Resultsmentioning
confidence: 60%
“…The acceptor densities (see Supporting Information) estimated for pristine Sb 2 Se 3 and MoS 2 /Sb 2 Se 3 are ≈2.0×1016 and 5.6×1016 cm −3 , respectively. These values are one order of degree larger than that of the thermally evaporated Sb 2 Se 3 (e.g., 1.14×1015 cm −3 ) . The improved E fb is associated with the enhanced heterojunction quality and increased doping density with the sputtered MoS 2 layer.…”
Section: Resultsmentioning
confidence: 88%
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“…Sputtering, as a method using ions to bombard the TMDCs target, is able to create a vapor of the TMDCs material at low temperature and then, deposit on the substrate. Huang et al 108 reported an area‐scalable, thickness‐controllable, and high‐quality 2D MoS 2 synthesis method by using direct current (DC) sputtering of a MoS 2 target followed by postdeposited annealing. MoS 2 was deposited at 400°C using an Ar flow of 20 sccm, a working pressure of 10 mTorr, DC power of 50 W, and a stable sputtering rate of 0.1 nm s −1 , and then annealed in the atmosphere of S at 1000°C.…”
Section: Preparation Of Tmdcsmentioning
confidence: 99%
“…However, poor reproducibility and uniformity of exfoliated MoS 2 flakes significantly limit their practical applications. In this regard, massive efforts to grow large-area and high-crystalline MoS 2 films have been devoted, and a feasibility of diverse growth methods has been demonstrated, including chemical vapor deposition (CVD) 33,34 , atomic layer deposition (ALD) 35,36 , and physical vapor deposition (PVD) 37,38 . Nonetheless, the poor reliability and reproducibility of CVD owing to the unstable gas flow dynamic in the chamber as well as high-cost and low throughput of ALD reduce the availability of rather efficient and scalable growth techniques.…”
mentioning
confidence: 99%