2013
DOI: 10.1080/0371750x.2013.870768
|View full text |Cite
|
Sign up to set email alerts
|

Large Area Deposition of Polycrystalline Diamond Coatings by Microwave Plasma CVD

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
17
0

Year Published

2014
2014
2023
2023

Publication Types

Select...
6
1
1

Relationship

2
6

Authors

Journals

citations
Cited by 20 publications
(19 citation statements)
references
References 15 publications
2
17
0
Order By: Relevance
“…Chemical wet etching was done for the W11 diamond coating to remove the base substrate for getting the free standing diamond coating. Silicon base substrate was etched out by using hydrofluoric acid (HF), nitric acid (HNO 3 ) and acetic acid (CH 3 COOH) in the 1:1:1 volume ratio [37]. Thus, four different PCD surfaces were created to test the tribological behaviour against alumina ceramic balls.…”
Section: Processing Of Pcd Coatingsmentioning
confidence: 99%
“…Chemical wet etching was done for the W11 diamond coating to remove the base substrate for getting the free standing diamond coating. Silicon base substrate was etched out by using hydrofluoric acid (HF), nitric acid (HNO 3 ) and acetic acid (CH 3 COOH) in the 1:1:1 volume ratio [37]. Thus, four different PCD surfaces were created to test the tribological behaviour against alumina ceramic balls.…”
Section: Processing Of Pcd Coatingsmentioning
confidence: 99%
“…Polycrystalline diamond samples were fabricated with CSIR-CGCRI based DT1800 microwave plasma enhanced CVD (MPCVD) reactor on single crystal Si Polycrystalline Diamond Characterisations for High End Technologies DOI: http://dx.doi.org/10.5772/intechopen.85428 wafers [115]. Deposition was carried out for 4-10 days to grow 0.5-0.8 mm thick diamond coatings.…”
Section: Processing Of Polycrystalline Diamond (Pcd)mentioning
confidence: 99%
“…Polycrystalline diamond samples were fabricated with CSIR-CGCRI based DT1800 microwave plasma enhanced CVD (MPCVD) reactor on single crystal Si wafers [115]. Deposition was carried out for 4-10 days to grow 0.5-0.8 mm thick diamond coatings.…”
Section: Processing Of Polycrystalline Diamond (Pcd)mentioning
confidence: 99%