Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons

Liu, Hongchao; Luo, Yanhong; Kong, Weijie; Liu, Kaipeng; Du, Wenjuan; Zhao, Chengwei; Gao, Ping; Zhao, Zeyu; Wang, Changtao; Pu, Mingbo; Luo, Xiangang

doi:10.1364/ome.8.000199

Cited by 34 publications

(24 citation statements)

References 26 publications

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“…This intriguing phenomenon presents the promising possibility for security and encryption displays. [114], (iii) the dispersion relations of (left) natural materials and (right) HMMs. The group velocity is indicated by the arrows [130].…”

Section: Plasmonic-based Interference Lithographymentioning

confidence: 99%

“…Reproduced with permission from (a-i, ii) [129]; Copyright 2019 American Chemical Society, (b-i, ii) [114]; OSA Publishing, 2018, (a-iii, b-iii) [130]; MDPI, 2016, (c) [115]; Royal Society of Chemistry, 2015, and (d) [128]; De Gruyter, 2017. [114], (iii) the dispersion relations of (left) natural materials and (right) HMMs. The group velocity is indicated by the arrows [130].…”

Section: Plasmonic-based Interference Lithographymentioning

confidence: 99%

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Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Lee

et al. 2020

Sensors

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Metasurfaces have shown promising potential to miniaturize existing bulk optical components thanks to their extraordinary optical properties and ultra-thin, small, and lightweight footprints. However, the absence of proper manufacturing methods has been one of the main obstacles preventing the practical application of metasurfaces and commercialization. Although a variety of fabrication techniques have been used to produce optical metasurfaces, there are still no universal scalable and high-throughput manufacturing methods that meet the criteria for large-scale metasurfaces for device/product-level applications. The fundamentals and recent progress of the large area and high-throughput manufacturing methods are discussed with practical device applications. We systematically classify various top-down scalable patterning techniques for optical metasurfaces: firstly, optical and printing methods are categorized and then their conventional and unconventional (emerging/new) techniques are discussed in detail, respectively. In the end of each section, we also introduce the recent developments of metasurfaces realized by the corresponding fabrication methods.

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Section: Plasmonic-based Interference Lithographymentioning

confidence: 99%

Section: Plasmonic-based Interference Lithographymentioning

confidence: 99%

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Lee

et al. 2020

Sensors

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“…LIL is a simple method for PR template fabrication, although metal deposition should also be considered when this process is used for the fabrication of an SERS sensor, because, for practical SERS applications, the whole fabrication procedure should be simple and inexpensive. The deposition of the target metal onto the PR template is mostly conducted via vacuum-based deposition, such as thermal deposition [ 23 ], physical vapor deposition (PVD) [ 24 ], and sputtering [ 25 ], which guarantee an excellent surface quality. However, these processes are complex and time-consuming, often reducing the advantages of LIL, which is a simple ambient-condition process.…”

Section: Introductionmentioning

confidence: 99%

Sensitive and Reproducible Gold SERS Sensor Based on Interference Lithography and Electrophoretic Deposition

Hwang

Yang

2018

Sensors

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Surface-enhanced Raman spectroscopy (SERS) is a promising analytical tool due to its label-free detection ability and superior sensitivity, which enable the detection of single molecules. Since its sensitivity is highly dependent on localized surface plasmon resonance, various methods have been applied for electric field-enhanced metal nanostructures. Despite the intensive research on practical applications of SERS, fabricating a sensitive and reproducible SERS sensor using a simple and low-cost process remains a challenge. Here, we report a simple strategy to produce a large-scale gold nanoparticle array based on laser interference lithography and the electrophoretic deposition of gold nanoparticles, generated through a pulsed laser ablation in liquid process. The fabricated gold nanoparticle array produced a sensitive, reproducible SERS signal, which allowed Rhodamine 6G to be detected at a concentration as low as 10−8 M, with an enhancement factor of 1.25 × 105. This advantageous fabrication strategy is expected to enable practical SERS applications.

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“…As depicted in Figure , structures of around 45 nm half‐pitch 1:1 aspect ratio have been achieved . Further reducing the metal diffraction grating period could result in higher resolution according to simulation studies …”

Section: Hyperbolic Metal‐dielectric Multilayersmentioning

confidence: 99%

Plasmonic Lithography: Recent Progress

Hong

Blaikie

2019

Advanced Optical Materials

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Plasmonic lithography has received extensive attention as both a potential candidate for next generation lithography and as an interesting testbed to test the fundamental resolution limits of optical imaging and patterning. Owing to the utilization of the otherwise lost evanescent near fields containing high frequency information, surface plasmon-based lithographic techniques can break the diffraction limit in conventional photolithography; resolution down to approximately 20 nm using visible light has been experimentally demonstrated, and theoretical studies have analyzed methods that have the potential for creating nanopatterns with sub-10 nm resolution. This paper reviews the research progress and various modalities of plasmonic lithography, addresses current obstacles and problems, and provides an outlook for practical application.

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Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons

Cited by 34 publications

References 26 publications

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Sensitive and Reproducible Gold SERS Sensor Based on Interference Lithography and Electrophoretic Deposition

Plasmonic Lithography: Recent Progress

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