Abstract:Fabrication of large-area devices with patternable nanostructures is important for practical applications in optical or electrical devices. In this work, we describe an easy and environment-friendly method for preparing large-area nano-dot (ND) arrays via the electrolytic reaction of a metal oxide film. NDs with various size and morphology can be obtained by adjusting the applied voltage, electrolysis time, and the film thickness of the indium tin oxide (ITO) layer. High-density NDs with size of 50-60 nm can b… Show more
High percentage of N2 in the air can provide abundant nitrogen source for the ammonia industry. However, nitrogen fixation process still faces great challenges due to the stable nitrogen-nitrogen triple...
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