“…By flood exposing a thick spincoated photoresist with a collimated beam through a suitably designed phase mask, one can make complex 3D structures over a large area. While the technique is still in an early phase of development, the method has been successfully employed by the Rogers group 29 and Thomas group 30 to fabricate complex 3D periodic and quasi-periodic structures at the submicrometer scale. So far, however, PMIL has been typically performed using commercially available photoresist materials such as SU-8, which is unsuitable for tissue engineering, biosensors, or drug-delivery applications where biocompatibility, functionalization, and drug loading of the materials is essential.…”