2023
DOI: 10.1021/acsnano.3c02537
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Label-Free Neuropeptide Detection beyond the Debye Length Limit

Biddut K. Sarker,
Reeshav Shrestha,
Kristi M. Singh
et al.

Abstract: Biosensors with high selectivity, high sensitivity, and real-time detection capabilities are of significant interest for diagnostic applications as well as human health and performance monitoring. Graphene field-effect transistor (GFET) based biosensors are suitable for integration into wearable sensor technology and can potentially demonstrate the sensitivity and selectivity necessary for real-time detection and monitoring of biomarkers. Previously reported DC-mode GFET biosensors showed a high sensitivity fo… Show more

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Cited by 3 publications
(1 citation statement)
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“…For comparison, the FET fabricated by random SiNW arrays (black curve in Figure 5g) showed only an I on/off ratio >10 5 and high SS of 396 mV dec −1 . Since the off current and SS performances of the FET device are highly dependent on the diameter of the SiNW channel, considering the influence of Debye screening on the control of mobile charge carrier in the semiconductor channel, 48,49 the current in the thin channel is easier to close than that in the large and random channel diameter. This can also be experimentally demonstrated by the performances of FET device fabricated by using thicker SiNW arrays with diameter of ∼45 nm and ∼100 nm in Figure S5, with I on/off ratio >10 5 and high SS of 320 mV dec −1 .…”
Section: Uniform Growth Of Orderly Sinw Arraymentioning
confidence: 99%
“…For comparison, the FET fabricated by random SiNW arrays (black curve in Figure 5g) showed only an I on/off ratio >10 5 and high SS of 396 mV dec −1 . Since the off current and SS performances of the FET device are highly dependent on the diameter of the SiNW channel, considering the influence of Debye screening on the control of mobile charge carrier in the semiconductor channel, 48,49 the current in the thin channel is easier to close than that in the large and random channel diameter. This can also be experimentally demonstrated by the performances of FET device fabricated by using thicker SiNW arrays with diameter of ∼45 nm and ∼100 nm in Figure S5, with I on/off ratio >10 5 and high SS of 320 mV dec −1 .…”
Section: Uniform Growth Of Orderly Sinw Arraymentioning
confidence: 99%