La1−xSrxMnO3 Thin Films on Silicon Prepared by Magnetron Sputtering: Optimization of the Film Structure and Magnetic Properties by Postdeposition Annealing
Abstract:Herein, a systematic study of postdeposition annealing for La1−xSrxMnO3 (LSMO) films regarding their structural, electronic, (magneto‐)optical, and magnetic properties is presented. The samples are prepared by magnetron sputtering at room temperature on silicon (111) substrates with native oxide and are annealed in ambient atmosphere for 12 h in a temperature range from 600 to 875 °C. The stoichiometry of the films is investigated by X‐ray photoelectron spectroscopy (XPS), and Raman spectroscopy is utilized to… Show more
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