2015
DOI: 10.3390/fib3030206
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Kinetics of Thermally Activated Physical Processes in Disordered Media

Abstract: Abstract:We describe a framework for modeling the writing and erasure of thermally-distributed activated processes that we can specifically apply to UV-induced refractive index change, particularly in fibers. From experimental measurements (isochrons and/or isotherms), this framework allows to find the distribution function of the activation energy by providing only a constant, which can be determined by a simple variable change when a few assumptions are fulfilled. From this modeling, it is possible to know t… Show more

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Cited by 18 publications
(14 citation statements)
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References 43 publications
(61 reference statements)
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“…This corresponds to full erasure after a 30min thermal treatment at 650°C in Borofloat® 33 and 1025°C in ULE® glass. These values are quite close to their respective annealing points T a : 652°C for Borofloat® 33 and 1000°C for ULE®.Note the temperatures mentioned here are dependent on the duration of the isochronal plateau and a longer duration will shift down this "full erasure" temperature, which is somehow at the image of the glass transition temperature range, and revealing in such a way that the erasure mechanisms are in fact distributed36 .On the contrary, the R norm of both GeO 2 -doped SiO 2 and 70SiO 2 -30Al 2 O 3 exhibit a higher thermal stability and quite similar trends. The decay starts slowly at 650°C leading to 10% erasure at 850°C in 70SiO 2 -30Al 2 O 3 .…”
supporting
confidence: 77%
“…This corresponds to full erasure after a 30min thermal treatment at 650°C in Borofloat® 33 and 1025°C in ULE® glass. These values are quite close to their respective annealing points T a : 652°C for Borofloat® 33 and 1000°C for ULE®.Note the temperatures mentioned here are dependent on the duration of the isochronal plateau and a longer duration will shift down this "full erasure" temperature, which is somehow at the image of the glass transition temperature range, and revealing in such a way that the erasure mechanisms are in fact distributed36 .On the contrary, the R norm of both GeO 2 -doped SiO 2 and 70SiO 2 -30Al 2 O 3 exhibit a higher thermal stability and quite similar trends. The decay starts slowly at 650°C leading to 10% erasure at 850°C in 70SiO 2 -30Al 2 O 3 .…”
supporting
confidence: 77%
“…Consequently, in Figure 5a is displayed a comparison of the thermal stability of the waveplates, studied through an annealing experiment of isochronal (∆t = 30 min) annealing steps (∆T = 50 • C). It is worth pointing out that the curves in Figure 5 represents the "stability curve" provided that the criterion (δtk 0 ) -(∆T/Tmax) 1 is fulfilled [49] and where k 0 is the pre-exponential factor in the Arrhenius rate constant of the erasure reaction. For nanogratings written in silica, k 0 has been estimated to be around de 5.10 5 -5.10 7 s −1 [50] depending on the laser writing parameters.…”
Section: Resultsmentioning
confidence: 99%
“…In various references [1,11,12], a framework for lifetime and passivation determination of standard type I FBG has been presented. The formalism is based on demarcation energy approximation and the existence of a master curve.…”
Section: Discussionmentioning
confidence: 99%
“…In the opposite situation, there may be several parallel or serial limiting reactions with different k 0 and different distributions. The analysis is thus more complex for achieving lifetime prediction but it is still possible to perform a VAREPA approach [1,11]. However, no MC exists anymore.…”
Section: Step 1: Build the MC With Data Obtained After Accelerated Agmentioning
confidence: 99%
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