Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: I. Production of CF2 and CF via electron-impact dissociation

Ivanov, V. V.; Klopovskii, K. S.; Lopaev, Dmitry; Proshina, O. V.; Rakhimov, A. T.; Рахимова, Т. В.; Rulev, G. B.

doi:10.1134/1.1458988

Cited by 8 publications

(2 citation statements)

References 48 publications

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“…The present work also requires knowledge of the partial dissociation cross-sections that produce the different CF x radicals. Considering the dissociation channel leading to CF 2 , we used the cross section obtained in our previous work [21]. Cross sections for two other dissociation channels into CF 3 and CF are determined using the total dissociation cross section taken from [20] with the ratio between different CF x channels from [22].…”

Section: Model Descriptionmentioning

confidence: 99%

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures

Proshina

Рахимова

Lopaev

et al. 2015

Plasma Sources Sci. Technol.

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Radio frequency capacitively coupled plasma (RF CCP) sustained at RF frequencies of 27 MHz in an Ar-CF 4 -CF 3 I gas mixture is studied experimentally and theoretically. The RF CCP in Ar-CF 4 -CF 3 I is simulated by using a 1D hybrid particle-in-cell-fluid numerical model. We pay special attention to the changes in plasma structure and fluxes to the electrode, negative ion and neutral radical production with admixture of CF 3 I in Ar-CF 4 plasma. With CF 3 I admixture the plasma becomes strongly electronegative as a result of the high electron attachment rate to the CF 3 I molecule. The atomic fluorine density becomes extremely low with addition of CF 3 I molecules due to the large volume loss in the reaction CF 3 I + F → CF 3 + IF. Optical emission spectrometry data on CF 2 emission at the wavelength of 250 nm indicate the essential sources of CF 2 in CF 3 I-containing plasma in the studied conditions, although direct dissociation channels for the CF 3 I molecule with CF 2 production have not been studied. Evaluation of CF 2 density in Ar-CF 4 -CF 3 I plasma was first carried out on the basis of the actinometry technique and numerical simulation. The possible mechanism of ultra-low-k film damage in the studied conditions is also discussed.

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Section: Model Descriptionmentioning

confidence: 99%

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures

Proshina

Рахимова

Lopaev

et al. 2015

Plasma Sources Sci. Technol.

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“…5,6 Radicals in the plasmas are formed through dissociation of neutral species by electron impact or dissociative electron attachment, or by surface reactions. 5,[7][8][9] Radical loss processes are self-reaction, further dissociation through electron impact, surface reaction, or through electron attachment. 7,9,10 The latter is particularly intriguing because it replaces a concentration of radicals, which may directly etch a surface by reacting to form a volatile species, with anions, which are unlikely to interact with a surface due to the electronegative sheath surrounding the plasma.…”

Section: Introductionmentioning

confidence: 99%

Electron attachment to C2 fluorocarbon radicals at high temperature

Shuman

Miller

Viggiano

2013

The Journal of Chemical Physics

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Thermal electron attachment to the radical species C2F3 and C2F5 has been studied over the temperature range 300-890 K using the Variable Electron and Neutral Density Attachment Mass Spectrometry technique. Both radicals exclusively undergo dissociative attachment to yield F(-). The rate constant for C2F5 shows little dependence over the temperature range, remaining ~4 × 10(-9) cm(3) s(-1). The rate constant for C2F3 attachment rises steeply with temperature from 3 × 10(-11) cm(3) s(-1) at 300 K to 1 × 10(-9) cm(3) s(-1) at 890 K. The behaviors of both species at high temperature are in agreement with extrapolations previously made from data below 600 K using a recently developed kinetic modeling approach. Measurements were also made on C2F3Br and C2F5Br (used in this work as precursors to the radicals) over the same temperature range, and, for C2F5Br as a function of electron temperature. The attachment rate constants to both species rise with temperature following Arrhenius behavior. The attachment rate constant to C2F5Br falls with increasing electron temperature, in agreement with the kinetic modeling. The current data fall in line with past predictions of the kinetic modeling approach, again showing the utility of this simplified approach.

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Ozone Formation in a Coaxial DC Corona Discharge under Carbon Dioxide Gas Flow

Országh

Skalný

Mason

2007

Plasma Processes & Polymers

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Ozone formation has been monitored in DC corona discharges fed by pure carbon dioxide in a flowing regime. Ozone concentrations have been measured for both positive and negative polarities of the discharge. Several different electrical parameters of the discharge have been measured. The onset voltage in the positive corona is approximately 1 kV higher than in a similar negative discharge, however, the maximum ozone concentration and total discharge current were found to be higher in the negative corona discharge. The gas flow rate is shown to influence the CV characteristics within a negative corona but, in contrast, only a marginal effect of flow rate was observed in positive corona. The mobility of both negative and positive charge carriers in the drift region of the discharges have been derived from CV characteristics. magnified image

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Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: I. Production of CF2 and CF via electron-impact dissociation

Cited by 8 publications

References 48 publications

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures

Electron attachment to C2 fluorocarbon radicals at high temperature

Ozone Formation in a Coaxial DC Corona Discharge under Carbon Dioxide Gas Flow

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Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: I. Production of CF2 and CF via electron-impact dissociation

Cited by 8 publications

References 48 publications

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures

Electron attachment to C2 fluorocarbon radicals at high temperature

Ozone Formation in a Coaxial DC Corona Discharge under Carbon Dioxide Gas Flow

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Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF₄–CF₃I mixtures