1980
DOI: 10.1021/j100460a026
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Kinetics of the ClO + NO2 + M reaction

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Cited by 60 publications
(74 citation statements)
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“…There is excellent agreement between the various studies of this reaction in the falloff region close to the low pressure limit Cox and Lewis, 1979;Molina et al, 1980;Dasch et al, 1981;Handwerk and Zellner, 1984;Wallington and Cox, 1986;Percival et al, 1997 Reliability log k ∞ = ± 0.5 over the temperature range 250-350 K.…”
Section: Comments On Preferred Valuesmentioning
confidence: 52%
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“…There is excellent agreement between the various studies of this reaction in the falloff region close to the low pressure limit Cox and Lewis, 1979;Molina et al, 1980;Dasch et al, 1981;Handwerk and Zellner, 1984;Wallington and Cox, 1986;Percival et al, 1997 Reliability log k ∞ = ± 0.5 over the temperature range 250-350 K.…”
Section: Comments On Preferred Valuesmentioning
confidence: 52%
“…Alternatively, one may follow our policy of choosing a more reasonable F c such as recommended by Cobos and Troe (2003) and then fit k ∞ . Using F c =0.4 such as recommended also for HO+NO 2 (+M) → HONO 2 (+M), the rate data in the falloff range below 1 bar from Percival et al (1997) are well reproduced with a temperature independent k ∞ =(7±2)×10 −11 cm 3 molecule −1 s −1 .…”
Section: Comments On Preferred Valuesmentioning
confidence: 68%
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“…An FAD-O-Cl intermediate could react via a one-electron mechanism to form • Cl as the chlorinating species. Photolysis of ROCl to • Cl and • RO has been observed (47,48). However, in vanadium-dependent haloperoxides, a radical-generating reaction has been ruled out in favor of a mechanism generating cationic bromine (30).…”
Section: Discussionmentioning
confidence: 99%