The n-type 3C-SiC grown on Si(001) substrates by chemical vapor deposition was characterized by deep-level-transient spectroscopy (DLTS). DLTS peaks appeared near 160 K and 260 K with the emission rate being 26 s −1 . For the shallower level, the activation energy E a is 0.34 eV and the capture cross section at infinite temperature σ ∞ is 6.0 × 10 −17 cm 2 . For the deeper level, E a = 0.52 eV and σ ∞ = 9.5 × 10 −18 cm 2 . The capture cross section at the peak temperature was obtained by changing the injection pulse width, and it was found that the energy barrier of electron capture is negligibly small for these two traps.