2004
DOI: 10.1016/j.jnoncrysol.2004.02.013
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Kinetics of silicon film growth and the deposition phase diagram

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Cited by 21 publications
(14 citation statements)
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“…A number of previous review articles have been presented on different forms of CVD: thermal CVD [2][3][4][5][6][7][8][9][10][11], plasma enhanced PE-CVD [12][13][14][15][16][17][18][19], hot-wire or hot filament (HWCVD or HFCVD) [20][21][22][23][24][25][26][27][28] and not many of them have been as exhaustive in their respective areas. Pyrolysis, although classified under CVD in some text, has become a wide area of research and technology covering synthesis of new products, qualitative and quantitative spectroscopic analysis of fluids and, lately, alternative route to production of debri-free x-ray sources; these aspects are elaborated further in the sections that follow.…”
Section: Fig 1 Generalised Schematic Of Chemical Vapor Deposition Symentioning
confidence: 99%
“…A number of previous review articles have been presented on different forms of CVD: thermal CVD [2][3][4][5][6][7][8][9][10][11], plasma enhanced PE-CVD [12][13][14][15][16][17][18][19], hot-wire or hot filament (HWCVD or HFCVD) [20][21][22][23][24][25][26][27][28] and not many of them have been as exhaustive in their respective areas. Pyrolysis, although classified under CVD in some text, has become a wide area of research and technology covering synthesis of new products, qualitative and quantitative spectroscopic analysis of fluids and, lately, alternative route to production of debri-free x-ray sources; these aspects are elaborated further in the sections that follow.…”
Section: Fig 1 Generalised Schematic Of Chemical Vapor Deposition Symentioning
confidence: 99%
“…In the case of the hot-wire deposition of μc-Si:H transition material, the crystallinity tends to decrease with an increasing layer thickness, which, after a certain thickness, results in an amorphous upper part of the layer [9]. This is in contrast with what is generally observed for plasma-enhanced CVD [12][13][14][15]. To stay on the microcrystalline side of the amorphous-to-microcrystalline phase transition, the hydrogen dilution is, as indicated above, increased after half of the layer has been deposited.…”
Section: Methodsmentioning
confidence: 99%
“…These processes are very much dependent on the deposition conditions. In general, crystalline growth is enhanced by the presence of atomic hydrogen, which chemically interacts with the growing surface [46,74,75].…”
Section: Microcrystalline or Nanocrystalline Siliconmentioning
confidence: 99%